Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Wenbing Yang0
Girish Dixit0
Samantha Siamhwa Tan0
Tamal Mukherjee0
Yang Pan0
Date of Patent
September 3, 2024
0Patent Application Number
176270540
Date Filed
September 9, 2020
0Patent Citations
Patent Primary Examiner
Patent abstract
A method for selectively etching a stack with respect to a mask is provided. An atomic layer etch is provided to at least partially etch the stack, wherein the atomic layer etch forms at least some residue. An ion beam is provided to etch the stack, wherein the ion beam etch removes at least some of the residue from the atomic layer etch.
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