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US Patent 12005389 Retrofittable dry media abatement reactor
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Is a
Patent
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Date Filed
October 2, 2023
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Date of Patent
June 11, 2024
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Patent Application Number
18479346
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Patent Citations
US Patent 7323042 Abatement system targeting a by-pass effluent stream of a semiconductor process tool
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US Patent 7736600 Apparatus for manufacturing a process abatement reactor
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Patent Inventor Names
Kimberly E. Konar
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Justin Weinstein
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
12005389
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Patent Primary Examiner
Frank M Lawrence, Jr.
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CPC Code
B01D 53/40
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B01D 53/82
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B01D 2253/102
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B01D 2258/0216
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B01D 2259/4145
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H01L 21/67017
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B01D 53/0454
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B01D 53/0423
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B01D 53/0446
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