US Patent 12005389 Retrofittable dry media abatement reactor

A system to abate an emission stream from a semiconductor manufacturing process is disclosed. The system includes a media canister to abate the emission stream in response to an abatement fault in an abatement apparatus. The media canister includes a reaction chamber configured to receive the emission stream in response to the abatement fault, and a dry media disposed within the reaction chamber to abate the emission stream. The dry media includes at least one reactive and/or absorbent material which catalyzes at least one chemical reaction to remove at least one pollutant from the emission stream and yield exhaust substantially free of the at least one pollutant.