US Patent 11966212 Spectrographic monitoring using a neural network

Patent

Applied Materials

Applied Materials

US Patent 7052921 System and method using in situ scatterometry to detect photoresist pattern integrity during the photolithography process

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US Patent 7930058 Nanotopography control and optimization using feedback from warp data

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US Patent 9551567 Reducing noise in spectral data from polishing substrates

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US Patent 6939198 Polishing system with in-line and in-situ metrology

United States Patent and Trademark Office

Kenneth M Lo

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H01L 21/67242

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G05B 13/027

H01L 21/67092

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