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US Patent 7656528 Periodic patterns and technique to control misalignment between two layers

Patent 7656528 was granted and assigned to KLA-Tencor on February, 2010 by the United States Patent and Trademark Office.

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Contents

Is a
Patent
Patent

Patent attributes

Current Assignee
KLA-Tencor
KLA-Tencor
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7656528
Patent Inventor Names
Michael Faeyrman0
Ibrahim Abdulhalim0
Michael Friedmann0
Mike Adel0
Date of Patent
February 2, 2010
Patent Application Number
11673115
Date Filed
February 9, 2007
Patent Citations Received
‌
US Patent 12025575 Soft x-ray optics with improved filtering
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US Patent 12019030 Methods and systems for targeted monitoring of semiconductor measurement quality
0
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US Patent 12085515 Methods and systems for selecting wafer locations to characterize cross-wafer variations based on high-throughput measurement signals
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US Patent 11955391 Process monitoring of deep structures with X-ray scatterometry
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US Patent 11966212 Spectrographic monitoring using a neural network
0
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US Patent 11990380 Methods and systems for combining x-ray metrology data sets to improve parameter estimation
0
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US Patent 11955308 Water cooled, air bearing based rotating anode x-ray illumination source
0
Patent Primary Examiner
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L. G. Lauchman
Patent abstract

A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.

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