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US Patent 11961627 Vacuum chamber arrangement for charged particle beam generator

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Contents

Is a
Patent
Patent
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Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
119616270
Patent Inventor Names
Marco Jan-Jaco Wieland0
Alexander Hendrik Vincent Van Veen0
Willem Henk Urbanus0
Date of Patent
April 16, 2024
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Patent Application Number
183269350
Date Filed
May 31, 2023
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Patent Citations
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US Patent 7019908 Modulator circuitry
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US Patent 7060984 Multi-charged beam lens and charged beam exposure apparatus using the same
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US Patent 7084414 Charged particle beamlet exposure system
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US Patent 7129502 Apparatus for generating a plurality of beamlets
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US Patent 7781728 Ion transport device and modes of operation thereof
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US Patent 8089056 Projection lens arrangement
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US Patent 8198602 Electrostatic lens structure
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US Patent 8445869 Projection lens arrangement
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Patent Primary Examiner
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David E Smith
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CPC Code
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H01J 2237/002
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H01J 2237/16
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H01J 2237/032
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H01J 2237/024
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H01J 37/12
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H01J 2237/1215
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H01J 2237/1825
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G21K 1/02
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Patent abstract

The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.

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