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US Patent 11894477 Electrical device with stress buffer layer and stress compensation layer

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Is a
Patent
Patent
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Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
118944770
Patent Inventor Names
Emily Thomson0
Michael Rondon0
Andrew Clarke0
Date of Patent
February 6, 2024
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Patent Application Number
173220730
Date Filed
May 17, 2021
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Patent Citations
‌
US Patent 8808513 Stress adjustment in reactive sputtering
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US Patent 10515905 Semiconductor device with anti-deflection layers
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US Patent 9412902 Semiconductor structure with stress-reducing buffer structure
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US Patent 11410937 Semiconductor device with aluminum nitride anti-deflection layer
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US Patent 7564057 Semiconductor device having an aluminum nitride film
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US Patent 8481376 Group III nitride semiconductor devices with silicon nitride layers and methods of manufacturing such devices
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Patent Primary Examiner
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Benjamin P Sandvik
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Patent abstract

An electrical device includes a substrate with a compressive layer, a neutral stress buffer layer and a tensile stress compensation layer. The stress buffer layer and the stress compensation layer may each be formed with aluminum nitride using different processing parameters to provide a different intrinsic stress value for each layer. The aluminum nitride tensile layer is configured to counteract stresses from the compressive layer in the device to thereby control an amount of substrate bow in the device. This is useful for protecting fragile materials in the device, such as mercury cadmium telluride. The aluminum nitride stress compensation layer also can compensate for forces, such as due to CTE mismatches, to protect the fragile layer. The device may include temperature-sensitive materials, and the aluminum nitride stress compensation layer or stress buffer layer may be formed at a temperature below the thermal degradation temperature of the temperature-sensitive material.

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