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US Patent 11804373 Selective layer formation using deposition and removing

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
Date Filed
September 23, 2022
Date of Patent
October 31, 2023
Patent Application Number
17934817
Patent Citations
‌
US Patent 10316406 Methods of forming an ALD-inhibiting layer using a self-assembled monolayer
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US Patent 10343186 Vapor phase deposition of organic films
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US Patent 10373820 Deposition of organic films
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US Patent 10378105 Selective deposition with surface treatment
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US Patent 10378810 Eco-friendly ice pack to be easily separated and discharged
‌
US Patent 10428421 Selective deposition on metal or metallic surfaces relative to dielectric surfaces
‌
US Patent 10443123 Dual selective deposition
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US Patent 10453701 Deposition of organic films
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US Patent 10480064 Reaction chamber passivation and selective deposition of metallic films
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US Patent 10508337 Atomic layer deposition-inhibiting material
•••
Patent Inventor Names
Viljami J. Pore
Eva E. Tois
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
11804373
Patent Primary Examiner
‌
Ratisha Mehta
CPC Code
‌
C23C 16/45553
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C23C 16/40
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C23C 16/45536
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H01L 21/0228
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H01L 21/02164
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H01L 21/02172
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H01L 21/02211
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H01L 21/31058

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