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US Patent 11788190 Liquid vaporizer

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Patent abstractTimelineTable: Further ResourcesReferences
Is a
Patent
Patent

Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
11788190
Patent Inventor Names
Jereld Lee Winkler
Date of Patent
October 17, 2023
Patent Application Number
16911189
Date Filed
June 24, 2020
Patent Citations
‌
US Patent 9593422 Substrate processing apparatus and semiconductor device manufacturing method
‌
US Patent 9873942 Methods of vapor deposition with multiple vapor sources
‌
US Patent 7109113 Solid source precursor delivery system
‌
US Patent 7122085 Sublimation bed employing carrier gas guidance structures
‌
US Patent 7156380 Safe liquid source containers
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US Patent 7192486 Clog-resistant gas delivery system
‌
US Patent 7334595 Cabinet for chemical delivery with solvent purging and removal
‌
US Patent 7334708 Integral blocks, chemical delivery systems and methods for delivering an ultrapure chemical
...
Patent Primary Examiner
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Joseph A Miller, Jr.
CPC Code
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C23C 16/45557
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C23C 16/4481
‌
C23C 16/45561
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C23C 16/45544
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C23C 16/45587
Patent abstract

A semiconductor processing device is disclosed. The semiconductor device includes a reactor and a vaporizer configured to provide a reactant vapor to the reactor. The device can include a process control chamber between the vaporizer and the reactor. The device can include a control system configured to modulate a pressure in the process control chamber based at least in part on feedback of measured pressure in the process control chamber.

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