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US Patent 11746417 Clean isolation valve for reduced dead volume

Patent 11746417 was granted and assigned to Applied Materials on September, 2023 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Current Assignee
Applied Materials
Applied Materials
Date Filed
September 20, 2022
Date of Patent
September 5, 2023
Patent Applicant
Applied Materials
Applied Materials
Patent Application Number
17948323
Patent Citations
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US Patent 7896030 Sensor-equipped joint member
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US Patent 7985350 Additives to prevent degradation of cyclic alkene derivatives
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US Patent 8216374 Gas coupler for substrate processing chamber
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US Patent 8973615 Fluid control device
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US Patent 9269567 High productivity combinatorial processing using pressure-controlled one-way valves
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US Patent 9574268 Pulsed valve manifold for atomic layer deposition
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US Patent 10370761 Pulsed valve manifold for atomic layer deposition
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US Patent 10662527 Manifolds for uniform vapor deposition
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US Patent 10636626 Dogbone inlet cone profile for remote plasma oxidation chamber
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US Patent 7418978 Methods and apparatus for providing fluid to a semiconductor device processing apparatus
•••
Patent Inventor Names
Ashutosh Agarwal
Sanjeev Baluja
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
11746417
Patent Primary Examiner
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Rudy Zervigon
CPC Code
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C23C 16/45544
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C23C 16/45565
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C23C 16/45561
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C23C 16/45536
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B05D 1/60
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C23C 16/18
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H01J 37/32357
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H01J 37/3244
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C23C 16/4412
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C23C 16/455
•••

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