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US Patent 11703460 Methods and systems for optical surface defect material characterization

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Is a
Patent
Patent
1

Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
1
Patent Number
117034601
Date of Patent
July 18, 2023
1
Patent Application Number
169133961
Date Filed
June 26, 2020
1
Patent Citations
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US Patent 7436508 Systems, circuits and methods for reducing thermal damage and extending the detection range of an inspection system
1
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US Patent 7492451 Simultaneous multi-spot inspection and imaging
1
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US Patent 7643157 Phase shift amount measurement apparatus and transmittance measurement apparatus
1
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US Patent 7671982 Systems, circuits and methods for reducing thermal damage and extending the detection range of an inspection system
1
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US Patent 7787114 Systems and methods for inspecting a specimen with light at varying power levels
1
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US Patent 8194240 Enhanced focusing capability on a sample using a spot matrix
1
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US Patent 8755044 Large particle detection for multi-spot surface scanning inspection systems
1
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US Patent 8885158 Surface scanning inspection system with adjustable scan pitch
1
...
Patent Primary Examiner
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Tri T Ton
1
CPC Code
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H01L 51/0074
1
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C07F 15/0033
1
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C09K 11/06
1
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C09K 2211/1007
1
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C09K 2211/1011
1
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C09K 2211/1059
1
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C09K 2211/1066
1
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C09K 2211/1074
1
...

Methods and systems for detecting and classifying defects based on the phase of dark field scattering from a sample are described herein. In some embodiments, throughput is increased by detecting and classifying defects with the same optical system. In one aspect, a defect is classified based on the measured relative phase of scattered light collected from at least two spatially distinct locations in the collection pupil. The phase difference, if any, between the light transmitted through any two spatially distinct locations at the pupil plane is determined from the positions of the interference fringes in the imaging plane. The measured phase difference is indicative of the material composition of the measured sample. In another aspect, an inspection system includes a programmable pupil aperture device configured to sample the pupil at different, programmable locations in the collection pupil.

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