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US Patent 11604063 Self-calibrated overlay metrology using a skew training sample

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
Date Filed
September 13, 2021
Date of Patent
March 14, 2023
Patent Application Number
17473742
Patent Citations
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US Patent 10324050 Measurement system optimization for X-ray based metrology
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US Patent 10352695 X-ray scatterometry metrology for high aspect ratio structures
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US Patent 10502694 Methods and apparatus for patterned wafer characterization
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US Patent 10769320 Integrated use of model-based metrology and a process model
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US Patent 10707175 Asymmetric overlay mark for overlay measurement
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US Patent 10775323 Full beam metrology for X-ray scatterometry systems
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US Patent 10013518 Model building and analysis engine for combined X-ray and optical metrology
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US Patent 10101670 Statistical model-based metrology
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
11604063
Patent Primary Examiner
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Elias Desta
CPC Code
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G01B 21/24
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G03F 7/70516
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G03F 7/70775
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G03F 7/70633
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G06T 7/12
Industry
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