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US Patent 10769320 Integrated use of model-based metrology and a process model

Patent 10769320 was granted and assigned to KLA-Tencor on September, 2020 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Patent Applicant

KLA-Tencor

Current Assignee

KLA-Tencor

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

107693201

Date of Patent

September 8, 2020

Patent Application Number

141078501

Date Filed

December 16, 2013

Patent Citations Received

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US Patent 11309202 Overlay metrology on bonded wafers

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US Patent 11713959 Overlay metrology using spectroscopic phase

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US Patent 12117810 AI-based determination of action plan for manufacturing component carriers

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US Patent 12117347 Metrology target design for tilted device designs

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US Patent 11018064 Multiple-tool parameter set configuration and misregistration measurement system and method

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US Patent 11043239 Magneto-optic Kerr effect metrology systems

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US Patent 11604063 Self-calibrated overlay metrology using a skew training sample

Patent Primary Examiner

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Gregory J. Toatley, Jr

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