Log in
Enquire now
‌

US Patent 11604063 Self-calibrated overlay metrology using a skew training sample

OverviewStructured DataIssuesContributors

Contents

TimelineTable: Further ResourcesReferences
Is a
Patent
Patent

Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
11604063
Date of Patent
March 14, 2023
Patent Application Number
17473742
Date Filed
September 13, 2021
Patent Citations
‌
US Patent 10324050 Measurement system optimization for X-ray based metrology
‌
US Patent 10352695 X-ray scatterometry metrology for high aspect ratio structures
‌
US Patent 10502694 Methods and apparatus for patterned wafer characterization
‌
US Patent 10769320 Integrated use of model-based metrology and a process model
‌
US Patent 10707175 Asymmetric overlay mark for overlay measurement
‌
US Patent 10775323 Full beam metrology for X-ray scatterometry systems
‌
US Patent 10013518 Model building and analysis engine for combined X-ray and optical metrology
‌
US Patent 10101670 Statistical model-based metrology
Patent Primary Examiner
‌
Elias Desta
CPC Code
‌
G01B 21/24
‌
G03F 7/70516
‌
G03F 7/70775
‌
G03F 7/70633
‌
G06T 7/12

An overlay metrology system may receive overlay data for in-die overlay targets within various fields on a skew training sample from one or more overlay metrology tools, wherein the in-die overlay targets within the fields have a range programmed overlay offsets, wherein the fields are fabricated with a range of programmed skew offsets. The system may further generate asymmetric target signals for the in-die overlay targets using an asymmetric function providing a value of zero when physical overlay is zero and a sign indicative of a direction of physical overlay. The system may further generate corrected overlay offsets for the in-die overlay targets on the asymmetric target signals, generate self-calibrated overlay offsets for the in-die overlay targets based on the programmed overlay offsets and the corrected overlay offsets, generate a trained overlay recipe, and generate overlay measurements for in-die overlay targets on additional samples using the trained overlay recipe.

Timeline

No Timeline data yet.

Further Resources

Title
Author
Link
Type
Date
No Further Resources data yet.

References

Find more entities like US Patent 11604063 Self-calibrated overlay metrology using a skew training sample

Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
Open Query Tool
Access by API
Golden Query Tool
Golden logo

Company

  • Home
  • Press & Media
  • Blog
  • Careers
  • WE'RE HIRING

Products

  • Knowledge Graph
  • Query Tool
  • Data Requests
  • Knowledge Storage
  • API
  • Pricing
  • Enterprise
  • ChatGPT Plugin

Legal

  • Terms of Service
  • Enterprise Terms of Service
  • Privacy Policy

Help

  • Help center
  • API Documentation
  • Contact Us
By using this site, you agree to our Terms of Service.