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US Patent 11600469 Plasma processing apparatus

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US Patent 11784030 Plasma processing apparatus
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 US Patent 11600469 Plasma processing apparatus

Article

A plasma processing apparatus includes a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, and a ground electrode arranged in the vacuum container and grounded.

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Is a
Patent
Patent
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
116004690
Date of Patent
March 7, 2023
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Patent Application Number
167201560
Date Filed
December 19, 2019
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Patent Citations
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US Patent 11114287 Radical output monitor for a remote plasma source and method of use
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US Patent 11170991 Plasma processing apparatus
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US Patent 10081869 Defect control in RF plasma substrate processing systems using DC bias voltage during movement of substrates
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US Patent 10083817 Linear remote plasma source
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US Patent 10157729 Soft pulsing
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US Patent 10224463 Film forming method, method of manufacturing semiconductor light-emitting device, semiconductor light-emitting device, and illuminating device
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US Patent 10231321 State-based adjustment of power and frequency
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US Patent 10354838 RF antenna producing a uniform near-field Poynting vector
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US Patent 10410889 Systems and methods for electrical and magnetic uniformity and skew tuning in plasma processing reactors
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US Patent 10544505 Deposition or treatment of diamond-like carbon in a plasma reactor
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US Patent 10553406 Plasma generating apparatus and substrate processing apparatus
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US Patent 10685810 RF antenna producing a uniform near-field Poynting vector
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US Patent 10879043 Device intrinsically designed to resonate, suitable for RF power transfer as well as group including such device and usable for the production of plasma
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US Patent 11013075 RF apparatus with arc prevention using non-linear devices
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US Patent 11315765 Plasma processing apparatus and plasma processing method
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Patent Primary Examiner
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Srinivas Sathiraju
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