Patent attributes
A system to process images includes a light source configured to emit a first illumination pattern onto one or more first portions of a scene. The system also includes an image sensor configured to capture light reflected from the scene in response to the emitted first illumination pattern. The system also includes an optimizer configured to perform raytracing of the light reflected from the scene. The system further includes a processor operatively coupled to the optimizer. The processor is configured to determine a parameter of a surface of the scene based on the raytracing, cause the light source to emit a second illumination pattern onto one or more second portions of the scene based at least in part on the parameter of the surface, and refine the parameter of the surface of the scene based on additional raytracing performed on reflected light from the second illumination pattern.
