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US Patent 11574826 High-density substrate processing systems and methods

Patent 11574826 was granted and assigned to Applied Materials on February, 2023 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
0
Current Assignee
Applied Materials
Applied Materials
0
Date Filed
July 7, 2020
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Date of Patent
February 7, 2023
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Patent Applicant
Applied Materials
Applied Materials
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Patent Application Number
16922874
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Patent Citations
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US Patent 10128134 Substrate transfer method and processing system
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US Patent 10109517 Rotational indexer with additional rotational axes
0
‌
US Patent 10363665 Linear robot arm with multiple end effectors
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US Patent 11117265 Robot for simultaneous substrate transfer
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US Patent 11355367 Robot for simultaneous substrate transfer
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US Patent 10224182 Mechanical suppression of parasitic plasma in substrate processing chamber
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US Patent 10347515 Method for manufacturing workpieces and apparatus
Patent Citations Received
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US Patent 12131938 Automatic wafer carrying system and method for transferring wafer using the system
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US Patent 11948817 Robot for simultaneous substrate transfer
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US Patent 12074042 High-density substrate processing systems and methods
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
11574826
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Patent Primary Examiner
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Mohammed Shamsuzzaman
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CPC Code
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H01L 21/67184
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H01L 21/67196
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H01L 21/67742
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H01L 21/67748
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H01L 21/68742
0
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H01L 21/68707
0
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H01L 21/67167
0
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H01L 21/6719
0
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H01L 21/68771
0
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H01L 21/67161
0

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