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US Patent 11574826 High-density substrate processing systems and methods

Patent 11574826 was granted and assigned to Applied Materials on February, 2023 by the United States Patent and Trademark Office.

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Contents

Is a
Patent
Patent
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Patent attributes

Patent Applicant
Applied Materials
Applied Materials
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Current Assignee
Applied Materials
Applied Materials
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
115748260
Date of Patent
February 7, 2023
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Patent Application Number
169228740
Date Filed
July 7, 2020
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Patent Citations
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US Patent 10128134 Substrate transfer method and processing system
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US Patent 10109517 Rotational indexer with additional rotational axes
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US Patent 10363665 Linear robot arm with multiple end effectors
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US Patent 11117265 Robot for simultaneous substrate transfer
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US Patent 11355367 Robot for simultaneous substrate transfer
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US Patent 10224182 Mechanical suppression of parasitic plasma in substrate processing chamber
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US Patent 10347515 Method for manufacturing workpieces and apparatus
Patent Citations Received
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US Patent 12131938 Automatic wafer carrying system and method for transferring wafer using the system
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US Patent 11948817 Robot for simultaneous substrate transfer
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US Patent 12074042 High-density substrate processing systems and methods
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Patent Primary Examiner
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Mohammed Shamsuzzaman
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CPC Code
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H01L 21/67184
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H01L 21/67196
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H01L 21/67742
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H01L 21/67748
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H01L 21/68742
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H01L 21/68707
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H01L 21/67167
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H01L 21/6719
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Exemplary substrate processing systems may include a factory interface and a load lock coupled with the factory interface. The systems may include a transfer chamber coupled with the load lock. The transfer chamber may include a robot configured to retrieve substrates from the load lock. The systems may include a chamber system positioned adjacent and coupled with the transfer chamber. The chamber system may include a transfer region laterally accessible to the robot. The transfer region may include a plurality of substrate supports disposed about the transfer region. Each substrate support of the plurality of substrate supports may be vertically translatable. The transfer region may also include a transfer apparatus rotatable about a central axis and configured to engage substrates and transfer substrates among the plurality of substrate supports. The chamber system may also include a plurality of processing regions vertically offset and axially aligned with an associated substrate support.

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