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US Patent 11447866 High temperature chemical vapor deposition lid

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Current Assignee
Applied Materials
Applied Materials
0
Date Filed
June 17, 2021
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Date of Patent
September 20, 2022
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Patent Applicant
Applied Materials
Applied Materials
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Patent Application Number
17350073
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Patent Citations
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US Patent 10872804 Apparatus and methods for isolating a reaction chamber from a loading chamber resulting in reduced contamination
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US Patent 10934619 Gas supply unit and substrate processing apparatus including the gas supply unit
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US Patent 11001925 Substrate processing apparatus
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US Patent 11110425 Gas distribution plate for thermal deposition
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US Patent 11251068 Substrate processing apparatus and substrate processing method
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US Patent 11222772 Substrate processing apparatus
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US Patent 10358721 Semiconductor manufacturing system including deposition apparatus
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US Patent 10714315 Semiconductor reaction chamber showerhead
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US Patent 10832903 Process feed management for semiconductor substrate processing
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US Patent 10858737 Showerhead assembly and components thereof
•••
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11447866
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Patent Primary Examiner
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Rudy Zervigon
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CPC Code
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C23C 16/45536
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C23C 16/50
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C23C 16/45565
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C23C 16/4412
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C23C 16/52
0
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C23C 16/455
0

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