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US Patent 11346882 Enhancement of yield of functional microelectronic devices

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Current Assignee
Tokyo Electron
Tokyo Electron
Date Filed
November 2, 2018
Date of Patent
May 31, 2022
Patent Applicant
Tokyo Electron
Tokyo Electron
Patent Application Number
16179492
Patent Citations
‌
US Patent 10727142 Process monitoring of deep structures with X-ray scatterometry
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US Patent 10354873 Organic mandrel protection process
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US Patent 10079183 Calculated electrical performance metrics for process monitoring and yield management
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US Patent 10181185 Image based specimen process control
‌
US Patent 10223494 Semiconductor device manufacturing method and mask manufacturing method
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US Patent 10234401 Method of manufacturing semiconductor devices by using sampling plans
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US Patent 10310490 Method and apparatus of evaluating a semiconductor manufacturing process
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
11346882
Patent Primary Examiner
‌
Duy T Nguyen
CPC Code
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G06F 30/30
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G06F 2119/18
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H01L 21/67276
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H01L 22/20
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G01R 31/2831
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H01L 21/67242
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H01L 22/10
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H01L 22/30
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H01L 22/12
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G01R 1/025

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