US Patent 11187989 Method for determining properties of an EUV source

Patent 11187989 was granted and assigned to Carl Zeiss SMT on November, 2021 by the United States Patent and Trademark Office.

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US Patent 11927888 Method for the tracking and identification of components of lithography systems, and lithography system

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Patent abstract

The disclosure provides a method for determining at least one property of an EUV source in a projection exposure apparatus for semiconductor lithography, wherein the property is determined on the basis of the electromagnetic radiation emanating from the EUV source, and wherein a thermal load for a component of the projection exposure apparatus is determined and the property is deduced on the basis of the thermal load determined.

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Patent Inventor Names

Markus Hauf0

Timo Laufer0

Ulrich Mueller0

Edits on 22 May, 2023