Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Markus Hauf0
Timo Laufer0
Ulrich Mueller0
Date of Patent
November 30, 2021
Patent Application Number
16824644
Date Filed
March 19, 2020
Patent Citations Received
Patent Primary Examiner
Patent abstract
The disclosure provides a method for determining at least one property of an EUV source in a projection exposure apparatus for semiconductor lithography, wherein the property is determined on the basis of the electromagnetic radiation emanating from the EUV source, and wherein a thermal load for a component of the projection exposure apparatus is determined and the property is deduced on the basis of the thermal load determined.
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