Patent 11178750 was granted and assigned to Fujikura on November, 2021 by the United States Patent and Trademark Office.
Realized is a multilayer substrate and a multilayer substrate array, each of which has a high degree of freedom in a production method. At least part of an outer periphery (51) of a multilayer substrate (100), which includes a wiring provided on an inner layer, is processed so as to have a wave shape.