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US Patent 11062899 Coated film removing apparatus

Patent 11062899 was granted and assigned to Tokyo Electron on July, 2021 by the United States Patent and Trademark Office.

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Patent
Patent
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Patent attributes

Patent Applicant
Tokyo Electron
Tokyo Electron
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Current Assignee
Tokyo Electron
Tokyo Electron
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
110628990
Patent Inventor Names
Masahide Tadokoro0
Koji Takayanagi0
Takafumi Hasimoto0
Taku Nagakane0
Date of Patent
July 13, 2021
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Patent Application Number
158762830
Date Filed
January 22, 2018
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Patent Citations Received
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US Patent 11908680 Substrate processing method and substrate processing apparatus
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Patent Primary Examiner
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Sylvia MacArthur
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Patent abstract

There is provided a coated film removing apparatus for removing, with a removal liquid, a peripheral portion of a coated film formed by supplying a coating liquid to a surface of a circular substrate, including: a rotary holding part configured to hold the substrate and rotate together with the substrate; a removal liquid nozzle configured to discharge the removal liquid on a peripheral portion of the surface of the substrate held by the rotary holding part so that the removal liquid is oriented toward a downstream side in a rotational direction of the substrate; and a control part configured to output a control signal so as to rotate the substrate at a rotation speed of 2,300 rpm or more when discharging the removal liquid.

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