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US Patent 10991554 Plasma processing system with synchronized signal modulation

Patent 10991554 was granted and assigned to Tokyo Electron on April, 2021 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
Current Assignee
Tokyo Electron
Tokyo Electron
Date Filed
September 21, 2018
Date of Patent
April 27, 2021
Patent Applicant
Tokyo Electron
Tokyo Electron
Patent Application Number
16138375
Patent Citations Received
‌
US Patent 11569066 Pulsed voltage source for plasma processing applications
‌
US Patent 12125679 Plasma processing apparatus and processing method
3
‌
US Patent 11462389 Pulsed-voltage hardware assembly for use in a plasma processing system
4
‌
US Patent 11476090 Voltage pulse time-domain multiplexing
‌
US Patent 11476145 Automatic ESC bias compensation when using pulsed DC bias
‌
US Patent 11495470 Method of enhancing etching selectivity using a pulsed plasma
9
‌
US Patent 11508554 High voltage filter assembly
‌
US Patent 12023081 Volumetrically oscillating plasma flows
12
‌
US Patent 12106938 Distortion current mitigation in a radio frequency plasma processing chamber
15
‌
US Patent 12111341 In-situ electric field detection method and apparatus
16
•••
Patent Inventor Names
Peter L. G. Ventzek
24
Barton Lane
24
Jianping Zhao
24
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
10991554
Patent Primary Examiner
‌
Wei (Victor) Y Chan

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