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US Patent 10989664 Optical systems and methods of characterizing high-k dielectrics

Patent 10989664 was granted and assigned to California Institute of Technology on April, 2021 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
1
Current Assignee
California Institute of Technology
California Institute of Technology
1
Date Filed
September 2, 2016
1
Date of Patent
April 27, 2021
1
Patent Applicant
California Institute of Technology
California Institute of Technology
1
Patent Application Number
15256442
1
Patent Citations
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US Patent 10613131 Pump and probe type second harmonic generation metrology
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US Patent 10274310 Surface sensing systems and methods for imaging a scanned surface of a sample via sum-frequency vibrational spectroscopy
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US Patent 10371668 Apparatus and methods for probing a material as a function of depth using depth-dependent second harmonic generation
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US Patent 10551325 Systems for parsing material properties from within SHG signals
1
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US Patent 10591525 Wafer metrology technologies
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US Patent 10663504 Field-biased second harmonic generation metrology
Patent Citations Received
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US Patent 11988611 Systems for parsing material properties from within SHG signals
10
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US Patent 11293965 Wafer metrology technologies
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US Patent 11946863 Second Harmonic Generation (SHG) optical inspection system designs
13
Patent Inventor Names
Harry A. Atwater
1
Philippe C. Adell
1
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
1
Patent Number
10989664
1
Patent Primary Examiner
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David P Porta
1

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