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US Patent 10964591 Processes for reducing leakage and improving adhesion

Patent 10964591 was granted and assigned to Taiwan Semiconductor Manufacturing Company on March, 2021 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
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Current Assignee
Taiwan Semiconductor Manufacturing Company
Taiwan Semiconductor Manufacturing Company
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Date Filed
June 24, 2019
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Date of Patent
March 30, 2021
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Patent Applicant
Taiwan Semiconductor Manufacturing Company
Taiwan Semiconductor Manufacturing Company
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Patent Application Number
16449736
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Patent Citations
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US Patent 10361122 Processes for reducing leakage and improving adhesion
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US Patent 10026704 Semiconductor package and method of forming the same
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US Patent 10665449 Integrate rinse module in hybrid bonding platform
Patent Citations Received
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US Patent 12020983 Processes for reducing leakage and improving adhesion
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US Patent 11651994 Processes for reducing leakage and improving adhesion
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US Patent 11688708 Chip structure and method for forming the same
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Patent Inventor Names
Hui-Jung Tsai
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Chen-Hua Yu
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Yun Chen Hsieh
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Hung-Jui Kuo
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
10964591
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Patent Primary Examiner
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Laura M Menz
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