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US Patent 10755895 Ion energy control by RF pulse shape
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Patent
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Current Assignee
Lam Research
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Date Filed
December 2, 2016
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Date of Patent
August 25, 2020
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Patent Applicant
Lam Research
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Patent Application Number
15367469
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Patent Citations
US Patent 10325760 System, method and apparatus for using optical data to monitor RF generator operations
US Patent 10032605 Methods and apparatus for controlling plasma in a plasma processing system
US Patent 10340122 Systems and methods for tailoring ion energy distribution function by odd harmonic mixing
Patent Citations Received
US Patent 11462390 Multi-level parameter and frequency pulsing with a low angular spread
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US Patent 11266004 Plasma generation device including matching device, and impedance matching method
Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
10755895
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Patent Primary Examiner
Amy Cohen Johnson
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