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US Patent 10727119 Process integration approach of selective tungsten via fill
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Is a
Patent
Current Assignee
Applied Materials
Date Filed
January 18, 2019
Date of Patent
July 28, 2020
Patent Applicant
Applied Materials
Patent Application Number
16252100
Patent Citations
US Patent 10157786 Selective formation of metallic films on metallic surfaces
US Patent 10014213 Selective bottom-up metal feature filling for interconnects
US Patent 10256144 Process integration approach of selective tungsten via fill
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
10727119
Patent Primary Examiner
Long Pham
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