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US Patent 10672590 Frequency tuning for a matchless plasma source
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Patent
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Current Assignee
Lam Research
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Date Filed
March 14, 2018
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Date of Patent
June 2, 2020
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Patent Applicant
Lam Research
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Patent Application Number
15921266
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Patent Citations
US Patent 10264663 Matchless plasma source for semiconductor wafer fabrication
Patent Citations Received
US Patent 11335539 Systems and methods for optimizing power delivery to an electrode of a plasma chamber
Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
10672590
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Patent Primary Examiner
Renan Luque
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