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US Patent 10665434 Slip ring, support mechanism, and plasma processing apparatus

Patent 10665434 was granted and assigned to Tokyo Electron on May, 2020 by the United States Patent and Trademark Office.

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Patent Citations Received
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US Patent 12111341 In-situ electric field detection method and apparatus
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US Patent 12106938 Distortion current mitigation in a radio frequency plasma processing chamber
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US Patent 11984306 Plasma chamber and chamber component cleaning methods
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US Patent 11972924 Pulsed voltage source for plasma processing applications
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US Patent 11776788 Pulsed voltage boost for substrate processing
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US Patent 11699572 Feedback loop for controlling a pulsed voltage waveform
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=1066543400
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Infobox
Is a
Patent
Patent
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Patent Applicant
Tokyo Electron
Tokyo Electron
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Current Assignee
Tokyo Electron
Tokyo Electron
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
106654340
Date of Patent
May 26, 2020
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Patent Application Number
155581260
Date Filed
April 7, 2016
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=106654340
Patent Citations Received
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US Patent 11063395 Signal protection device and cable connector
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US Patent 11284500 Method of controlling ion energy distribution using a pulse generator
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US Patent 11462388 Plasma processing assembly using pulsed-voltage and radio-frequency power
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US Patent 11462389 Pulsed-voltage hardware assembly for use in a plasma processing system
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US Patent 11476090 Voltage pulse time-domain multiplexing
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US Patent 11476145 Automatic ESC bias compensation when using pulsed DC bias
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US Patent 11495470 Method of enhancing etching selectivity using a pulsed plasma
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US Patent 11508554 High voltage filter assembly
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US Patent 11569066 Pulsed voltage source for plasma processing applications
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Patent Primary Examiner
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Yuechuan Yu
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Edits on 27 Apr, 2023
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edited on 1 Feb, 2023
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Patent Citations Received
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US Patent 11569066 Pulsed voltage source for plasma processing applications
0
Edits on 25 Nov, 2022
"update inverses"
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edited on 25 Nov, 2022
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Infobox (+1 properties)
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Patent Citations Received
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US Patent 11508554 High voltage filter assembly
0
Edits on 9 Nov, 2022
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Golden AI
edited on 9 Nov, 2022
Edits made to:
Infobox (+1 properties)
Infobox
Patent Citations Received
‌
US Patent 11495470 Method of enhancing etching selectivity using a pulsed plasma
0
Edits on 28 Oct, 2022
"update inverses"
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Golden AI
edited on 28 Oct, 2022
Edits made to:
Infobox (+1 properties)
Infobox
Patent Citations Received
‌
US Patent 11476145 Automatic ESC bias compensation when using pulsed DC bias
0
"update inverses"
Golden AI profile picture
Golden AI
edited on 28 Oct, 2022
Edits made to:
Infobox (+1 properties)
Infobox
Patent Citations Received
‌
US Patent 11476090 Voltage pulse time-domain multiplexing
0

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