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US Patent 10659019 Nanosecond pulser ADC system

Patent 10659019 was granted and assigned to Eagle Harbor Technologies, Inc. on May, 2020 by the United States Patent and Trademark Office.

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US Patent 12111341 In-situ electric field detection method and apparatus
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US Patent 12106938 Distortion current mitigation in a radio frequency plasma processing chamber
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US Patent 11972924 Pulsed voltage source for plasma processing applications
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US Patent 11875971 Efficient energy recovery in a nanosecond pulser circuit
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US Patent 11776788 Pulsed voltage boost for substrate processing
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US Patent 11699572 Feedback loop for controlling a pulsed voltage waveform
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US Patent 11689107 Nanosecond pulser bias compensation
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US Patent 11670484 Variable output impedance RF generator
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=1065901900
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US Patent 11631573 High voltage resistive output stage circuit
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Infobox
Is a
Patent
Patent
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Patent Applicant
Eagle Harbor Technologies, Inc.
Eagle Harbor Technologies, Inc.
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Current Assignee
Eagle Harbor Technologies, Inc.
Eagle Harbor Technologies, Inc.
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
106590190
Date of Patent
May 19, 2020
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Patent Application Number
165253570
Date Filed
July 29, 2019
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=106590190
Patent Citations Received
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US Patent 10892140 Nanosecond pulser bias compensation
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US Patent 10903047 Precise plasma control system
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US Patent 10916408 Apparatus and method of forming plasma using a pulsed waveform
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US Patent 10923321 Apparatus and method of generating a pulsed waveform
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US Patent 10991553 Nanosecond pulser thermal management
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US Patent 11004660 Variable output impedance RF generator
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US Patent 11075058 Spatially variable wafer bias power system
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US Patent 11284500 Method of controlling ion energy distribution using a pulse generator
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US Patent 11302518 Efficient energy recovery in a nanosecond pulser circuit
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US Patent 11387076 Apparatus and method of generating a waveform
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US Patent 11404246 Nanosecond pulser bias compensation with correction
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US Patent 11430635 Precise plasma control system
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US Patent 11462388 Plasma processing assembly using pulsed-voltage and radio-frequency power
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US Patent 11462389 Pulsed-voltage hardware assembly for use in a plasma processing system
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US Patent 11476090 Voltage pulse time-domain multiplexing
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US Patent 11476145 Automatic ESC bias compensation when using pulsed DC bias
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US Patent 11495470 Method of enhancing etching selectivity using a pulsed plasma
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US Patent 11502672 High voltage nanosecond pulser with variable pulse width and pulse repetition frequency
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US Patent 11508554 High voltage filter assembly
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US Patent 11527383 Nanosecond pulser RF isolation for plasma systems
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US Patent 11532457 Precise plasma control system
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US Patent 11539352 Transformer resonant converter
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US Patent 11558048 High voltage nanosecond pulser
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US Patent 11569066 Pulsed voltage source for plasma processing applications
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US Patent 11587768 Nanosecond pulser thermal management
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Patent Primary Examiner
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Monica C King
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