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US Patent 10643867 Annealing system and method

Patent 10643867 was granted and assigned to Applied Materials on May, 2020 by the United States Patent and Trademark Office.

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Patent Citations Received
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US Patent 11881411 High pressure annealing process for metal containing materials
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Edits on 13 Sep, 2023
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edited on 13 Sep, 2023
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US Patent 11756803 Gas delivery system for high pressure processing chamber
Edits on 7 Sep, 2023
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edited on 7 Sep, 2023
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US Patent 11749555 Semiconductor processing system
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edited on 19 Jul, 2023
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US Patent 11705337 Tungsten defluorination by high pressure treatment
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Edits on 5 Jul, 2023
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edited on 5 Jul, 2023
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US Patent 11694912 High pressure and high temperature anneal chamber
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Edits on 25 May, 2023
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edited on 25 May, 2023
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=10643867
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edited on 12 Apr, 2023
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US Patent 11610773 Condenser system for high pressure processing system
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edited on 23 Mar, 2023
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Patent Citations Received
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US Patent 11361978 Gas delivery module
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Edits on 8 Mar, 2023
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edited on 8 Mar, 2023
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US Patent 11600507 Pedestal assembly for a substrate processing chamber
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Edits on 15 Feb, 2023
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US Patent 11527421 Gas delivery system for high pressure processing chamber
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Edits on 12 Oct, 2022
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edited on 12 Oct, 2022
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US Patent 11469113 High pressure and high temperature anneal chamber
0
Edits on 8 Oct, 2022
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edited on 8 Oct, 2022
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US Patent 11462417 High pressure and high temperature anneal chamber
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Edits on 25 Sep, 2022
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edited on 25 Sep, 2022
Edits on 23 Sep, 2022
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edited on 23 Sep, 2022
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Patent Citations Received
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US Patent 11361978 Gas delivery module
0
Edits on 15 Jun, 2022
"update inverses"
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Golden AI
edited on 15 Jun, 2022
Edits made to:
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Patent citations received
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US Patent 11361978 Gas delivery module
Edits on 8 Jun, 2022
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edited on 8 Jun, 2022
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Website URL
https://pdfpiw.uspto.gov/.piw?Docid=10643867

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