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US Patent 10586677 Semiconductor apparatus and charged particle ray exposure apparatus

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US Patent 12119204 Particle beam system and the use thereof for flexibly setting the current intensity of individual particle beams
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US Patent 12094683 Method for operating a multi-beam particle beam microscope
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US Patent 11935721 System comprising a multi-beam particle microscope and method for operating the same
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Patent abstract

A semiconductor apparatus according to an embodiment is a semiconductor apparatus including substrate having a recess provided at a first substrate face, a plurality of through holes provided in a predetermined region of the recess, and a plurality of protrusions provided on the recess in the predetermined region.

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US Patent 11657999 Particle beam system and method for the particle-optical examination of an object
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US Patent 11562881 Charged particle beam system
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US Patent 11562880 Particle beam system for adjusting the current of individual particle beams
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US Patent 11521827 Method of imaging a 2D sample with a multi-beam particle microscope
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Infobox
Is a
Patent
Patent
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
105866770
Date of Patent
March 10, 2020
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Patent Application Number
162883190
Date Filed
February 28, 2019
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Patent Citations Received
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US Patent 11239053 Charged particle beam system and method
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US Patent 11239054 Multi-beam particle beam system
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Patent Primary Examiner
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Michael Maskell
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US Patent 11239054 Multi-beam particle beam system
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US Patent 11239053 Charged particle beam system and method
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 US Patent 10586677 Semiconductor apparatus and charged particle ray exposure apparatus

Infobox
Is a
Patent
Patent
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
10586677
Date of patent
March 10, 2020
Patent application number
16288319
Date Filed
February 28, 2019
Patent primary examiner
‌
Michael Maskell

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