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US Patent 10510575 Substrate support with multiple embedded electrodes

Patent 10510575 was granted and assigned to Applied Materials on December, 2019 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
Current Assignee
Applied Materials
Applied Materials
Date Filed
September 20, 2017
Date of Patent
December 17, 2019
Patent Applicant
Applied Materials
Applied Materials
Patent Application Number
15710753
Patent Citations
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US Patent 10224822 Nanosecond pulser
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US Patent 10020800 High voltage nanosecond pulser with variable pulse width and pulse repetition frequency
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US Patent 10027314 Nonlinear transmission line high voltage pulse sharpening
Patent Citations Received
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US Patent 12111341 In-situ electric field detection method and apparatus
5
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US Patent 11462389 Pulsed-voltage hardware assembly for use in a plasma processing system
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US Patent 11476090 Voltage pulse time-domain multiplexing
‌
US Patent 11476145 Automatic ESC bias compensation when using pulsed DC bias
‌
US Patent 11495470 Method of enhancing etching selectivity using a pulsed plasma
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US Patent 11508554 High voltage filter assembly
‌
US Patent 12106938 Distortion current mitigation in a radio frequency plasma processing chamber
15
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US Patent 11462388 Plasma processing assembly using pulsed-voltage and radio-frequency power
‌
US Patent 11527383 Nanosecond pulser RF isolation for plasma systems
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US Patent 11532457 Precise plasma control system
•••
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
10510575
Patent Primary Examiner
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Charlee J. C. Bennett

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