Patent 10453709 was granted and assigned to Applied Materials on October, 2019 by the United States Patent and Trademark Office.
Embodiments of the present disclosure generally relate to cleaning substrates, and more particularly, to methods and apparatus for endpoint detection of a cleaning process. The apparatus includes an outer cleaning basin, a liner, and a circulation system coupled to the liner. The circulation system includes a filter for removing particles from a fluid. A liquid particle counter is fluidly coupled to fluid in the liner for performing particle counting. Methods for using the apparatus are also described.