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US Patent 10428419 Combination CVD/ALD method, source and pulse profile modification
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Date Filed
September 11, 2017
Date of Patent
October 1, 2019
Patent Application Number
15700247
Patent Citations Received
US Patent 11296189 Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures
US Patent 11289326 Method for reforming amorphous carbon polymer film
US Patent D947913 Susceptor shaft
US Patent 11295980 Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
US Patent 10685834 Methods for forming a silicon germanium tin layer and related semiconductor device structures
US Patent 10714335 Method of depositing thin film and method of manufacturing semiconductor device
US Patent 10714350 Methods for forming a transition metal niobium nitride film on a substrate by atomic layer deposition and related semiconductor device structures
US Patent 10714385 Selective deposition of tungsten
US Patent 10720331 Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures
US Patent 10731249 Method of forming a transition metal containing film on a substrate by a cyclical deposition process, a method for supplying a transition metal halide compound to a reaction chamber, and related vapor deposition apparatus
•••
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
10428419
Patent Primary Examiner
Kelly M Gambetta
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