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US Patent 10134837 Porous silicon post processing
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Patent
Date Filed
June 30, 2017
Date of Patent
November 20, 2018
Patent Application Number
15638874
Patent Citations Received
US Patent 11495575 RF devices with enhanced performance and methods of forming the same
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US Patent 12129168 Microelectronics package with vertically stacked MEMS device and controller device
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US Patent 11476177 Thermally enhanced semiconductor package with at least one heat extractor and process for making the same
US Patent 11476221 RF devices with enhanced performance and methods of forming the same
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US Patent 11495520 RF devices with enhanced performance and methods of forming the same
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US Patent 12080683 RF devices with enhanced performance and methods of forming the same
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US Patent 12112999 RF devices with enhanced performance and methods of forming the same
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US Patent 12125739 RF devices with enhanced performance and methods of forming the same utilizing localized SOI formation
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US Patent 12125825 RF devices with enhanced performance and methods of forming the same
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US Patent 11476152 RF devices with enhanced performance and methods of forming the same utilizing localized SOI formation
•••
Patent Inventor Names
Richard Hammond
0
Stephen Alan Fanelli
0
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
10134837
Patent Primary Examiner
Jarrett J Stark
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