US Patent 10128085 Method of plasma etching
Patent 10128085 was granted and assigned to Tokyo Electron on November, 2018 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
November 9, 2016
Date of Patent
November 13, 2018
Patent Applicant
Patent Application Number
15346886
Patent Citations Received
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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