US Patent 10109533 Nanosheet devices with CMOS epitaxy and method of forming

This disclosure relates to a method of forming nanosheet devices including: forming a first and second nanosheet stack on a substrate, the first and the second nanosheet stacks including a plurality of vertically spaced nanosheets disposed on the substrate and separated by a plurality of spacing members, each of the plurality of spacing members including a sacrificial layer and a pair of inner spacers formed on lateral ends of the sacrificial layer; growing a pair of epitaxial regions adjacent to the first and second nanosheet stacks from each of the plurality of nanosheets such that each of the plurality of inner spacers is enveloped by one of the epitaxial regions; covering the first nanosheet stack with a mask; and forming a pair of p-type source/drain regions on the second nanosheet stack, each of the pair of p-type source/drain regions being adjacent to the epitaxial regions on the second nanosheet stack.