Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Xuerang Hu0
Xuedong Liu0
Zhongwei Chen0
Weiming Ren0
Date of Patent
August 28, 2018
0Patent Application Number
154173600
Date Filed
January 27, 2017
0Patent Citations Received
0
...
Patent Primary Examiner
Patent abstract
A new multi-beam apparatus with a total FOV variable in size, orientation and incident angle, is proposed. The new apparatus provides more flexibility to speed the sample observation and enable more samples observable. More specifically, as a yield management tool to inspect and/or review defects on wafers/masks in semiconductor manufacturing industry, the new apparatus provide more possibilities to achieve a high throughput and detect more kinds of defects.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.