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US Patent 10056225 Adjusting substrate temperature to improve CD uniformity

Patent 10056225 was granted and assigned to Lam Research on August, 2018 by the United States Patent and Trademark Office.

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US Patent 12061227 Integrated heater and temperature measurement
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US Patent 11940487 Thermal solution for massively parallel testing
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US Patent 11852678 Multi-input multi-zone thermal control for device testing
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Patent abstract

A plasma etching system having a substrate support assembly with multiple independently controllable heater zones. The plasma etching system is configured to control etching temperature of predetermined locations so that pre-etch and/or post-etch non-uniformity of critical device parameters can be compensated for.

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US Patent 11774492 Test system including active thermal interposer device
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Harmeet Singh0
Keith Comendant0
Keith William Gaff0
Vahid Vahedi0
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US Patent 11754620 DUT placement and handling for active thermal interposer device
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US Patent 11693051 Thermal head for independent control of zones
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US Patent 11674999 Wafer scale active thermal interposer for device testing
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US Patent 11656273 High current device testing apparatus and systems
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US Patent 11609266 Active thermal interposer device
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US Patent 11587640 Carrier based high volume system level testing of devices with pop structures
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US Patent 11573262 Multi-input multi-zone thermal control for device testing
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US Patent 11567119 Testing system including active thermal interposer device
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