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US Patent 10014212 Selective deposition of metallic films

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
June 14, 2017
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Date of Patent
July 3, 2018
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Patent Application Number
15622510
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Patent Citations Received
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US Patent 11446699 Vapor phase deposition of organic films
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US Patent 11501965 Plasma enhanced deposition processes for controlled formation of metal oxide thin films
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US Patent 11501966 Selective layer formation using deposition and removing
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US Patent 11373876 Film forming method and film forming apparatus
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US Patent 11387107 Deposition of organic films
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US Patent 11389824 Vapor phase deposition of organic films
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US Patent 11396701 Passivation against vapor deposition
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US Patent 11404266 Semiconductor devices including a support pattern on a lower electrode structure
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US Patent 11430656 Deposition of oxide thin films
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US Patent 11830732 Selective passivation and selective deposition
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•••
Patent Inventor Names
Toshiharu Watarai
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Kunitoshi Namba
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Shang Chen
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Takahiro Onuma
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Dai Ishikawa
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
10014212
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Patent Primary Examiner
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Ratisha Mehta
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