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Nadine Norton
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Edits on 14 Dec, 2021
"Remove inverse infobox"
Golden AI
edited on 14 Dec, 2021
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Infobox
Patent primary examiner of
US Patent 7087180 Method for manufacturing a microlens substrate and method for manufacturing a liquid crystal panel
US Patent 7087183 Method of using an etchant solution for removing a thin metallic layer
US Patent 7091130 Method of forming a nanocluster charge storage device
US Patent 7094706 Device and method for etching a substrate by using an inductively coupled plasma
US Patent 7098141 Use of silicon containing gas for CD and profile feature enhancements of gate and shallow trench structures
US Patent 7101806 Deep trench formation in semiconductor device fabrication
US Patent 7101808 Chromate-free method for surface etching of stainless steel
US Patent 7105098 Method to control artifacts of microstructural fabrication
US Patent 7115210 Measurement to determine plasma leakage
US Patent 7115214 Method of forming barrier layer
US Patent 7115512 Methods of forming semiconductor constructions
US Patent 7115517 Method of fabricating a dual damascene interconnect structure
US Patent 7118685 Polishing liquid composition
US Patent 7122124 Method of fabricating film carrier
US Patent 7122125 Controlled polymerization on plasma reactor wall
US Patent 7125801 Method of manufacturing Group III nitride crystal substrate, etchant used in the method, Group III nitride crystal substrate, and semiconductor device including the same
US Patent 7125807 Method for manufacturing non-volatile memory cells on a semiconductor substrate
US Patent 7128804 Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof
US Patent 7128844 Metal/ceramic circuit board and method for producing same
US Patent 7128846 Process for producing group III nitride compound semiconductor
US Patent 7128975 Multicrystalline silicon substrate and process for roughening surface thereof
US Patent 7129175 Method of manufacturing semiconductor device
US Patent 7129184 Method of depositing an epitaxial layer of SiGe subsequent to a plasma etch
US Patent 7132306 Method of forming an interlevel dielectric layer employing dielectric etch-back process without extra mask set
US Patent 7132367 Polishing method
US Patent 7135410 Etch with ramping
US Patent 7135413 Cleaning solution for removing damaged portion of ferroelectric layer and cleaning method using the same
US Patent 7138068 Printed circuit patterned embedded capacitance layer
US Patent 7138342 Process of maintaining hybrid etch
US Patent 7141180 Etchant for wire, method of manufacturing wire using etchant, thin film transistor array panel including wire and manufacturing method thereof
US Patent 7141505 Method for bilayer resist plasma etch
US Patent 7141509 Method for fabricating a circuit device
US Patent 7141510 Plasma processing method
US Patent 7144521 High aspect ratio etch using modulation of RF powers of various frequencies
US Patent 7147791 Method of fabricating an injket printhead chip for use with a pulsating pressure ink supply
US Patent 7147794 Coating for forming a high definition aperture
US Patent 7147795 Method for surface treatment
US Patent 7147798 Aqueous based metal etchant
US Patent 7148147 CMP composition containing organic nitro compounds
US Patent 7148152 Method for fabricating a mask, method for fabricating a patterned thin film and a micro device
US Patent 7153443 Microelectromechanical structure and a method for making the same
US Patent 7153781 Method to etch poly Si gate stacks with raised STI structure
US Patent 7157015 Method of manufacturing a substrate with concave portions, a substrate with concave portions, a substrate with concave portions for microlenses, a microlens substrate, a transmission screen and a rear projector
US Patent 7157374 Method for removing a cap from the gate of an embedded silicon germanium semiconductor device
US Patent 7157375 Methods of downstream microwave photoresist removal and via clean, particularly following Stop-On TiN etching
US Patent 7157379 Strained semiconductor structures
US Patent 7160479 Method and apparatus for evaluating panel drip tests
US Patent 7160806 Thermal inkjet printhead processing with silicon etching
US Patent 7160812 Method for preventing electrode deterioration in etching apparatus
US Patent 7163640 Methods and systems for laser processing
US Patent 7169313 Plating method for circuitized substrates
US Patent 7169707 Method of manufacturing package substrate with fine circuit pattern using anodic oxidation
US Patent 7169712 Method for manufacturing a microlens
US Patent 7176140 Adhesion promotion for etch by-products
US Patent 7179394 Method for manufacturing liquid crystal display
US Patent 7179398 Etchant for wires, a method for manufacturing the wires using the etchant, a thin film transistor array substrate and a method for manufacturing the same including the method
US Patent 7179745 Method for offsetting a silicide process from a gate electrode of a semiconductor device
US Patent 7186653 Polishing slurries and methods for chemical mechanical polishing
US Patent 7186658 Method and resulting structure for PCMO film to obtain etching rate and mask to selectively by inductively coupled plasma
US Patent 7186659 Plasma etching method
US Patent 7186661 Method to improve profile control and N/P loading in dual doped gate applications
US Patent 7189334 Printhead fabrication method
US Patent 7192533 Method of manufacturing nanowires and electronic device
US Patent 7192867 Protection of low-k dielectric in a passivation level
US Patent 7192876 Transistor with independent gate structures
US Patent 7192879 Method for manufacturing micro-structural unit
US Patent 7195716 Etching process and patterning process
US Patent 7199053 Method for detecting end-point of chemical mechanical polishing process
US Patent 7202176 Enhanced stripping of low-k films using downstream gas mixing
US Patent 7204936 Polishing composition
US Patent 7217371 Optical control interface between controller and process chamber
US Patent 7223352 Supercritical carbon dioxide/chemical formulation for ashed and unashed aluminum post-etch residue removal
US Patent 7226869 Methods for protecting silicon or silicon carbide electrode surfaces from morphological modification during plasma etch processing
US Patent 7232529 Polishing compound for chemimechanical polishing and polishing method
US Patent 7232762 Method for forming an improved low power SRAM contact
US Patent 7239067 Method of manufacturing a piezoelectric thin film resonator, manufacturing apparatus for a piezoelectric thin film resonator, piezoelectric thin film resonator, and electronic component
US Patent 7241920 Filterable surfactant composition
US Patent 7244625 Plasma processing method and plasma processing device
US Patent 7250370 Two step post-deposition treatment of ILD layer for a lower dielectric constant and improved mechanical properties
US Patent 7250372 Method for BARC over-etch time adjust with real-time process feedback
US Patent 7256130 Process for defining a chalcogenide material layer, in particular in a process for manufacturing phase change memory cells
US Patent 7262136 Modified facet etch to prevent blown gate oxide and increase etch chamber life
US Patent 7262138 Organic BARC with adjustable etch rate
US Patent 7270758 Method to improve ability to perform CMP-assisted liftoff for trackwidth definition
US Patent 7271099 Forming a conductive pattern on a substrate
US Patent 7276445 Method for forming pattern using printing method
US Patent 7276449 Gas assisted method for applying resist stripper and gas-resist stripper combinations
US Patent 7279111 Monolithic printhead with built-in equipotential network and associated manufacturing method
US Patent 7279424 Method for fabricating thin film magnetic heads using CMP with polishing stop layer
US Patent 7282449 Thermal treatment of a semiconductor layer
US Patent 7285226 Method for fabricating a fluid ejection device
US Patent 7285495 Methods for thermally treating a semiconductor layer
US Patent 7288205 Hermetic low dielectric constant layer for barrier applications
US Patent 7288212 Additive composition, slurry composition including the same, and method of polishing an object using the slurry composition
US Patent 7291280 Multi-step methods for chemical mechanical polishing silicon dioxide and silicon nitride
US Patent 7291562 Method to form topography in a deposited layer above a substrate
US Patent 7294579 Method for forming contact opening
US Patent 7300603 Chemical mechanical planarization compositions for reducing erosion in semiconductor wafers
US Patent 7300880 Methods for forming fine photoresist patterns
US Patent 7300881 Plasma etching method
US Patent 7303690 Microlens forming method
US Patent 7312159 Compositions for dissolution of low-k dielectric films, and methods of use
US Patent 7312161 Advanced process control for low variation treatment in immersion processing
US Patent 7323113 Pattern transfer with self-similar sacrificial mask layer and vector magnetic field sensor
US Patent 7329366 Method of polishing implantable medical devices to lower thrombogenecity and increase mechanical stability
US Patent 7332441 Passivation of porous semiconductors
US Patent 7341949 Process for forming lead-free bump on electronic component
US Patent 7351354 Tungsten metal removing solution and method for removing tungsten metal by use thereof
US Patent 7354521 Method of fabricating inkjet print head using photocurable resin composition
US Patent 7354526 Processing method for glass substrate, processed glass product and stress applying apparatus
US Patent 7354527 Chemical mechanical polishing pad and chemical mechanical polishing process
US Patent 7357873 Polymide thin film self-assembly process
US Patent 7358190 Methods of filling gaps by deposition on materials having different deposition rates
US Patent 7381339 Increased yield of cubic crystalline optical elements by crystal orientation
US Patent 7384872 Method of producing substrate having patterned organosilane layer and method of using the substrate having the patterned organosilane layer
US Patent 7390745 Pattern enhancement by crystallographic etching
US Patent 7390746 Multiple deposition for integration of spacers in pitch multiplication process
US Patent 7393460 Plasma processing method and plasma processing apparatus
US Patent 7396480 Method for front end of line fabrication
US Patent 7399709 Complementary replacement of material
US Patent 7402526 Plasma processing, deposition, and ALD methods
US Patent 7402531 Method for selectively controlling lengths of nanowires
US Patent 7419610 Method of partial depth material removal for fabrication of CPP read sensor
US Patent 7419913 Methods of forming openings into dielectric material
US Patent 7425275 Shadow mask and method of fabricating vertically tapered structure using the shadow mask
US Patent 7427566 Method of making an electronic device cooling system
US Patent 7429335 Substrate passage formation
US Patent 7429533 Pitch reduction
US Patent 7431861 Etchant, replenishment solution and method for producing copper wiring using the same
US Patent 7435687 Plasma processing method and plasma processing device
US Patent 7442319 Poly etch without separate oxide decap
US Patent 7442323 Potassium monopersulfate solutions
US Patent 7445726 Photoresist trimming process
US Patent 7448396 Apparatus and method of removing particles
US Patent 7452481 Polishing slurry and method of reclaiming wafers
US Patent 7452814 Method of polishing GaN substrate
US Patent 7452815 Methods of forming integrated circuit devices having polished tungsten metal layers therein
US Patent 7456104 Semiconductor device and manufacturing method thereof
US Patent 7473380 Etching liquid
US Patent 7479237 Method of fabricating vertical probe head
US Patent 7479361 Chemically amplified resist composition, process for manufacturing semiconductor device and patterning process
US Patent 7481943 Method suitable for etching hydrophillic trenches in a substrate
US Patent 7493904 Liquid processing apparatus and liquid processing method
US Patent 7510974 CMP process
US Patent 7521365 Selective epitaxy process with alternating gas supply
US Patent 7524430 Fluid ejection device structures and methods therefor
US Patent 7531102 Simultaneous selective polymer deposition and etch pitch doubling for sub 50nm line/space patterning
US Patent 7540970 Methods of fabricating a semiconductor device
US Patent 7541292 Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zones
US Patent 7544307 Metal polishing liquid and polishing method using it
US Patent 7547463 Method of imparting non-stick property to metal surface
US Patent 7547636 Pulsed ultra-high aspect ratio dielectric etch
US Patent 7550394 Semiconductor device and fabrication process thereof
US Patent 7579284 Etching solution, method of forming a pattern using the same, method of manufacturing a multiple gate oxide layer using the same and method of manufacturing a flash memory device using the same
US Patent 7582564 Process and composition for conductive material removal by electrochemical mechanical polishing
US Patent 7597819 Redox buffered hydrofluoric acid etchant for the reduction of galvanic attack during release etching of MEMS devices having noble material films
US Patent 7598177 Methods of filling trenches using high-density plasma deposition (HDP)
US Patent 7601273 Polishing slurry composition and method of using the same
US Patent 7608192 Image sensor and method for fabricating the same
US Patent 7622389 Selective contact formation using masking and resist patterning techniques
US Patent 7629257 Combined etching and doping substances
US Patent 7629260 Organosilane hardmask compositions and methods of producing semiconductor devices using the same
US Patent 7632420 Laser removal of layer or coating from a substrate
US Patent 7666322 Method of producing nozzle plate and method of producing liquid-droplet jetting apparatus
US Patent 7674392 Method of fabricating a hinge
US Patent 7674395 Laser etching method and apparatus therefor
US Patent 7691440 Method and installation for the densification of substrates by means of chemical vapor infiltration
US Patent 7691446 High temperature silicone processing of fuser structure
US Patent 7700165 Method of forming deposited film and method of forming photovoltaic element
US Patent 7700496 Transistor having a metal nitride layer pattern, etchant and methods of forming the same
US Patent 7704565 Method of making a layered component with vector discrimination in a variable deposition rate process
US Patent 7723233 Semiconductor device and method of fabricating a semiconductor device
US Patent 7727587 Method of manufacturing honeycomb and foam composite material
US Patent 7727589 Method of producing esthetically pleasing ornaments from bone components
US Patent 7732007 Method of making a polarizer plate
US Patent 7732334 Method for manufacturing semiconductor device
US Patent 7732345 Method for using a modified post-etch clean rinsing agent
US Patent 7758925 Crack-free erosion resistant coatings on steels
US Patent 7767263 Method of manufacturing a mould part
US Patent 7767584 In-situ pre-coating of plasma etch chamber for improved productivity and chamber condition control
US Patent 7943526 Process for the wet-chemical treatment of one side of silicon wafers
US Patent 7967997 Plasma etching method, plasma etching apparatus, control program and computer-readable storage medium
US Patent 7968148 Integrated circuit system with clean surfaces
US Patent 7981316 Selective barrier metal polishing method
US Patent 8008209 Thermal gradient control of high aspect ratio etching and deposition processes
Edits on 8 Dec, 2021
Golden AI
edited on 8 Dec, 2021
Edits made to:
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Infobox
Patent primary examiner of
US Patent 8008209 Thermal gradient control of high aspect ratio etching and deposition processes
Edits on 8 Dec, 2021
Golden AI
edited on 8 Dec, 2021
Edits made to:
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+1
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Infobox
Patent primary examiner of
US Patent 7981316 Selective barrier metal polishing method
Golden AI
edited on 8 Dec, 2021
Edits made to:
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+1
properties)
Infobox
Patent primary examiner of
US Patent 7968148 Integrated circuit system with clean surfaces
Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox
(
+1
properties)
Infobox
Patent primary examiner of
US Patent 7967997 Plasma etching method, plasma etching apparatus, control program and computer-readable storage medium
Golden AI
edited on 7 Dec, 2021
Edits made to:
Infobox
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+1
properties)
Infobox
Patent primary examiner of
US Patent 7943526 Process for the wet-chemical treatment of one side of silicon wafers
Edits on 5 Dec, 2021
Golden AI
edited on 5 Dec, 2021
Edits made to:
Infobox
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+1
properties)
Infobox
Patent primary examiner of
US Patent 7767584 In-situ pre-coating of plasma etch chamber for improved productivity and chamber condition control
Golden AI
edited on 5 Dec, 2021
Edits made to:
Infobox
(
+1
properties)
Infobox
Patent primary examiner of
US Patent 7767263 Method of manufacturing a mould part
Golden AI
edited on 5 Dec, 2021
Edits made to:
Infobox
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+1
properties)
Infobox
Patent primary examiner of
US Patent 7758925 Crack-free erosion resistant coatings on steels
Edits on 4 Dec, 2021
Golden AI
edited on 4 Dec, 2021
Edits made to:
Infobox
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+1
properties)
Infobox
Patent primary examiner of
US Patent 7732345 Method for using a modified post-etch clean rinsing agent
Golden AI
edited on 4 Dec, 2021
Edits made to:
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+1
properties)
Infobox
Patent primary examiner of
US Patent 7732334 Method for manufacturing semiconductor device
Golden AI
edited on 4 Dec, 2021
Edits made to:
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+1
properties)
Infobox
Patent primary examiner of
US Patent 7732007 Method of making a polarizer plate
Golden AI
edited on 4 Dec, 2021
Edits made to:
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+1
properties)
Infobox
Patent primary examiner of
US Patent 7727589 Method of producing esthetically pleasing ornaments from bone components
Golden AI
edited on 4 Dec, 2021
Edits made to:
Infobox
(
+1
properties)
Infobox
Patent primary examiner of
US Patent 7727587 Method of manufacturing honeycomb and foam composite material
Golden AI
edited on 4 Dec, 2021
Edits made to:
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+1
properties)
Infobox
Patent primary examiner of
US Patent 7723233 Semiconductor device and method of fabricating a semiconductor device
Golden AI
edited on 4 Dec, 2021
Edits made to:
Infobox
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+1
properties)
Infobox
Patent primary examiner of
US Patent 7704565 Method of making a layered component with vector discrimination in a variable deposition rate process
Golden AI
edited on 4 Dec, 2021
Edits made to:
Infobox
(
+1
properties)
Infobox
Patent primary examiner of
US Patent 7700496 Transistor having a metal nitride layer pattern, etchant and methods of forming the same
Edits on 4 Dec, 2021
Golden AI
edited on 4 Dec, 2021
Edits made to:
Infobox
(
+1
properties)
Infobox
Patent primary examiner of
US Patent 7700165 Method of forming deposited film and method of forming photovoltaic element
Golden AI
edited on 4 Dec, 2021
Edits made to:
Infobox
(
+1
properties)
Infobox
Patent primary examiner of
US Patent 7691446 High temperature silicone processing of fuser structure
Golden AI
edited on 4 Dec, 2021
Edits made to:
Infobox
(
+1
properties)
Infobox
Patent primary examiner of
US Patent 7691440 Method and installation for the densification of substrates by means of chemical vapor infiltration
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