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Lan Vinh

based in Vietnam

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derek cazares
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Vietnam
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Patent primary examiner of
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US Patent 11170979 Plasma etching method and plasma etching apparatus
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US Patent 11171007 Plasma processing apparatus and plasma etching method
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US Patent 7087179 Optical integrated circuits (ICs)
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US Patent 7087533 Method for fabricating semiconductor device
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US Patent 7091131 Method of forming integrated circuit structures in silicone ladder polymer
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US Patent 7091132 Ultrasonic assisted etch using corrosive liquids
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US Patent 7094695 Apparatus and method for conditioning a polishing pad used for mechanical and/or chemical-mechanical planarization
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US Patent 7094702 Layer-by-layer etching apparatus using neutral beam and method of etching using the same
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US Patent 7094704 Method of plasma etching of high-K dielectric materials
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US Patent 7101800 Chemical-mechanical polishing slurry and method
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US Patent 7105454 Use of ammonia for etching organic low-k dielectrics
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US Patent 7105455 Method for fabricating nonvolatile memory device
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US Patent 7109128 Semiconductor device and method of manufacturing the same
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US Patent 7112285 Conductive core substrate fabrication
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US Patent 7112532 Process for forming a dual damascene structure
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US Patent 7112535 Precision polysilicon resistor process
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US Patent 7112536 Plasma processing system and method
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US Patent 7115522 Method for manufacturing semiconductor device
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US Patent 7119024 Method and structure for a self-aligned silicided word line and polysilicon plug during the formation of a semiconductor device
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US Patent 7122475 Methods for using bi-modal abrasive slurries for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies
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US Patent 7125495 Large area electronic device with high and low resolution patterned film features
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US Patent 7129179 Method for topographical patterning of a device
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US Patent 7132370 Method for selective removal of high-k material
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US Patent 7138064 Semiconductor device and method of manufacturing the same
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US Patent 7138654 Chemical-mechanical polishing proximity correction method and correction pattern thereof
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US Patent 7141506 Method for evaluating dependence of properties of semiconductor substrate on plane orientation and semiconductor device using the same
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US Patent 7141508 Magnetoresistive effect thin-film magnetic head and manufacturing method of magnetoresistive effect thin-film magnetic head
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US Patent 7144816 Polysilicon opening polish
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US Patent 7151056 Method and apparatus for forming a planarizing pad having a film and texture elements for planarization of microelectronic substrates
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US Patent 7151057 Flexible MEMS transducer manufacturing method
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US Patent 7153767 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing
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US Patent 7153779 Method to eliminate striations and surface roughness caused by dry etch
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US Patent 7157380 Damascene process for fabricating interconnect layers in an integrated circuit
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US Patent 7160813 Etch back process approach in dual source plasma reactors
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US Patent 7163898 Method for manufacturing semiconductor integrated circuit structures
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US Patent 7172707 Sputtered spring films with low stress anisotropy
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US Patent 7172977 Method for non-destructive removal of cured epoxy from wafer backside
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US Patent 7183220 Plasma etching methods
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US Patent 7192874 Method for reducing foreign material concentrations in etch chambers
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US Patent 7192886 Method for using additives in the caustic etching of silicon for obtaining improved surface characteristics
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US Patent 7196015 Pattern forming method and electric device fabricating method using the same
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US Patent 7196016 Fabrication process for preparing recording head sliders made from silicon substrates with SiO
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US Patent 7196017 Method for etching smooth sidewalls in III-V based compounds for electro-optical devices
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US Patent 7196018 Semiconductor etching paste and the use thereof for localized etching of semiconductor substrates
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US Patent 7201851 Vacuum processing apparatus and substrate transfer method
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US Patent 7202180 Methods of forming semiconductor devices using an etch stop layer
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US Patent 7205239 Method of manufacturing semiconductor wafer and method of manufacturing semiconductor device
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US Patent 7205243 Process for producing a mask on a substrate
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US Patent 7208421 Method and apparatus for production of metal film or the like
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US Patent 7208422 Plasma processing method
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US Patent 7214623 Planarization system and method using a carbonate containing fluid
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US Patent 7220678 Method for etching of a silicon substrate and etching apparatus
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US Patent 7220680 Method for photolithography in semiconductor manufacturing
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US Patent 7223699 Plasma etch reactor and method
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US Patent 7223701 In-situ sequential high density plasma deposition and etch processing for gap fill
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US Patent 7223702 Method of and apparatus for performing sequential processes requiring different amounts of time in the manufacturing of semiconductor devices
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US Patent 7226865 Process for forming pattern and method for producing liquid crystal display apparatus
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US Patent 7226868 Method of etching high aspect ratio features
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US Patent 7229925 Methods of forming a pattern for a semiconductor device
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US Patent 7229930 Selective etching of low-k dielectrics
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US Patent 7232526 Method and apparatus for controlling material removal from semiconductor substrate using induced current endpointing
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US Patent 7232528 Surface treatment agent for copper and copper alloy
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US Patent 7241699 Wide bandgap semiconductor device construction
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US Patent 7244681 Methods for selective removal of material from wafer alignment marks
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US Patent 7247256 CMP slurry for forming aluminum film, CMP method using the slurry, and method for forming aluminum wiring using the CMP method
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US Patent 7247566 CMP method for copper, tungsten, titanium, polysilicon, and other substrates using organosulfonic acids as oxidizers
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US Patent 7247573 Process for forming tapered trenches in a dielectric material
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US Patent 7247576 Method of manufacturing a semiconductor device
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US Patent 7253117 Methods for use of pulsed voltage in a plasma reactor
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US Patent 7256133 Method of manufacturing a semiconductor device
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US Patent 7264743 Fin structure formation
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US Patent 7268080 Method for printing contacts on a substrate
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US Patent 7268084 Method for treating a substrate
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US Patent 7268086 Method for reducing critical dimension and semiconductor etching method
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US Patent 7271103 Surface treated low-k dielectric as diffusion barrier for copper metallization
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US Patent 7271104 Method for dry etching fluid feed slots in a silicon substrate
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US Patent 7271105 Method for making a micro-fluid ejection device
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US Patent 7271106 Critical dimension control for integrated circuits
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US Patent 7273815 Etch features with reduced line edge roughness
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US Patent 7276451 Method for manufacturing semiconductor device
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US Patent 7279426 Like integrated circuit devices with different depth
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US Patent 7279428 Method of preventing photoresist residues
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US Patent 7285499 Polymer spacers for creating sub-lithographic spaces
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US Patent 7288008 Nonlithographic method of defining geometries for plasma and/or ion implantation treatments on a semiconductor wafer
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US Patent 7288206 High-purity alkali etching solution for silicon wafers and use thereof
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US Patent 7288485 Device and method for anisotropic plasma etching of a substrate, particularly a silicon element
‌
US Patent 7288489 Process for thinning a semiconductor workpiece
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US Patent 7296532 Bypass gas feed system and method to improve reactant gas flow and film deposition
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US Patent 7297637 Use of pulsed grounding source in a plasma reactor
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US Patent 7300884 Pattern forming method, underlayer film forming composition, and method of manufacturing semiconductor device
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US Patent 7303998 Plasma processing method
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US Patent 7309654 Technique for reducing etch damage during the formation of vias and trenches in interlayer dielectrics
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US Patent 7309657 Circuit board, liquid discharge apparatus, and method of manufacturing the circuit board
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US Patent 7311503 Micromachined fluidic device and method for making same
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US Patent 7311851 Apparatus and method for reactive atom plasma processing for material deposition
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US Patent 7312158 Method of forming pattern
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US Patent 7312486 Stripe board dummy metal for reducing coupling capacitance
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US Patent 7314834 Semiconductor device fabrication method
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US Patent 7316979 Method and apparatus for providing an integrated active region on silicon-on-insulator devices
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US Patent 7316980 Method for forming ferrocapacitors and FeRAM devices
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US Patent 7320941 Plasma stabilization method and plasma apparatus
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US Patent 7323416 Method and composition for polishing a substrate
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US Patent 7329910 Semiconductor substrates and field effect transistor constructions
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US Patent 7332104 Slurry for CMP, polishing method and method of manufacturing semiconductor device
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US Patent 7335600 Method for removing photoresist
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US Patent 7335602 Charge-free layer by layer etching of dielectrics
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US Patent 7338904 Method for manufacturing single-side mirror surface wafer
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US Patent 7338908 Method for fabrication of semiconductor interconnect structure with reduced capacitance, leakage current, and improved breakdown voltage
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US Patent 7338911 Method for etching and for forming a contact hole using thereof
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US Patent 7344989 CMP wafer contamination reduced by insitu clean
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US Patent 7348276 Fabrication process of semiconductor device and polishing method
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US Patent 7348279 Method of making an integrated circuit, including forming a contact
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US Patent 7354865 Method for removal of pattern resist over patterned metal having an underlying spacer layer
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US Patent 7354870 Process for chemical etching of parts fabricated by stereolithography
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US Patent 7361609 Mask patterns for semiconductor device fabrication and related methods
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US Patent 11183391 Method for real time monitoring semiconductor fabrication process
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US Patent 7365018 Fabrication of semiconductor device for flash memory with increased select gate width
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US Patent 7368388 Cerium oxide abrasives for chemical mechanical polishing
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US Patent 7368392 Method of fabricating a gate structure of a field effect transistor having a metal-containing gate electrode
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US Patent 7368397 Method for monitoring edge bead removal process of copper metal interconnection
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US Patent 7375034 Recessing trench to target depth using feed forward data
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US Patent 7375038 Method for plasma etching a chromium layer through a carbon hard mask suitable for photomask fabrication
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US Patent 7377991 Ultrasonic assisted etch using corrosive liquids
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US Patent 7378352 Method of fabricating semiconductor device
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US Patent 7378353 High selectivity BPSG to TEOS etchant
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US Patent 7384870 Method for manufacturing glass substrate
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US Patent 7384876 Method and apparatus for determining consumable lifetime
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US Patent 7384877 Technique for reducing silicide defects by reducing deleterious effects of particle bombardment prior to silicidation
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US Patent 7387968 Batch photoresist dry strip and ash system and process
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US Patent 7396430 Apparatus and method for confined area planarization
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US Patent 7396482 Post exposure resist bake
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US Patent 7396484 Methods of fabricating complex blade geometries from silicon wafers and strengthening blade geometries
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US Patent 7396768 Copper damascene chemical mechanical polishing (CMP) for thin film head writer fabrication
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US Patent 7399713 Selective treatment of microelectric workpiece surfaces
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US Patent 7402521 Method for chemically mechanically polishing organic film, method of manufacturing semiconductor device, and program therefor
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US Patent 7402522 Hard mask structure for deep trenched super-junction device
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US Patent 7404909 Mirror including dielectric portions and a method of manufacturing the same
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US Patent 7405163 Selectively accelerated plating of metal features
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US Patent 7410908 Manufacturing method for a semiconductor device
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US Patent 7413993 Process for removing a residue from a metal structure on a semiconductor substrate
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US Patent 7416990 Method for patterning low dielectric layer of semiconductor device
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US Patent 7416991 High resolution patterning of surface energy utilizing high resolution monomolecular resist for fabrication of patterned media masters
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US Patent 7425512 Method for etching a substrate and a device formed using the method
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US Patent 7429537 Methods and apparatus for rinsing and drying
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US Patent 7435354 Treatment method for surface of photoresist layer and method for forming patterned photoresist layer
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US Patent 7435689 Process for fabricating electron emitting device, electron source, and image display device
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US Patent 7439190 Fabrication method of semiconductor device
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US Patent 7446049 Method for fabricating semiconductor device using amorphous carbon layer as sacrificial hard mask
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US Patent 7452824 Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of plural chamber parameters
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US Patent 7465405 Method of fabricating printheads having multiple nozzle assemblies
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US Patent 7473377 Plasma processing method
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US Patent 7476624 Dry-etching method
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US Patent 7479461 Method of etching silicon anisotropically
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US Patent 7485579 Method of manufacturing a semiconductor device
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US Patent 7488428 Method for forming stacked via-holes in printed circuit boards
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US Patent 7491649 Plasma processing apparatus
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US Patent 7494929 Automatic gain control
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US Patent 7510668 Low cost antenna array fabrication technology
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US Patent 7510978 Method for forming mask for using dry-etching and method for forming fine structure pattern
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US Patent 7514364 Hydrophilicity treatment method of a silicon wafer
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US Patent 11187836 Method of building a 3D functional optical material layer stacking structure
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US Patent 7517802 Method for reducing foreign material concentrations in etch chambers
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US Patent 7517810 Reduced metal design rules for power devices
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US Patent 7517811 Method for fabricating a floating gate of flash rom
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US Patent 7524429 Method of manufacturing double-sided printed circuit board
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US Patent 7524767 Method for manufacturing a micro-electro-mechanical structure
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US Patent 7531100 Method of making a fuel cell component using an easily removed mask
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US Patent 7531104 Micro-optic elements and method for making the same
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US Patent 7531463 Fabrication of semiconductor interconnect structure
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US Patent 7538041 Magnetic recording medium, method of manufacturing the same, and intermediate for magnetic recording medium
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US Patent 7544304 Process and system for quality management and analysis of via drilling
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US Patent 7547398 Self-aligned process for fabricating imprint templates containing variously etched features
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US Patent 7547642 Micro-structure manufacturing method
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US Patent 7553428 Method of fabricating spacers and method of installing spacers in flat panel device
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US Patent 7553768 Substrate and a method for polishing a substrate
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US Patent 7560391 Forming of trenches or wells having different destinations in a semiconductor substrate
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US Patent 7563723 Critical dimension control for integrated circuits
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US Patent 7569490 Electrochemical etching
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US Patent 7569491 Method for enlarging a nano-structure
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US Patent 7572736 Method of dry-etching semiconductor devices
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US Patent 7578943 Liquid discharge head and producing method therefor
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US Patent 7582569 Distributor and distributing method, plasma processing system and method, and process for fabricating LCD
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US Patent 7582570 Compositions for removal of processing byproducts and method for using same
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US Patent 7585421 Method of producing a sheet comprising through pores and the application thereof in the production of micronic and submicronic filters
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US Patent 7585422 Optical element manufacturing method
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US Patent 7585779 Fabrication method of semiconductor device
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US Patent 7589023 Method of manufacturing semiconductor wafer
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US Patent 7595004 Ink jet printhead and relative manufacturing process
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US Patent 7598175 Apparatus and method for confined area planarization
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US Patent 7605089 Method of manufacturing an electronic device
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US Patent 7608548 Method for cleaning a multilayer substrate and method for bonding substrates and method for producing a bonded wafer
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US Patent 7611993 Plasma processing method and plasma processing apparatus
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US Patent 7611995 Method for removing silicon oxide film and processing apparatus
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US Patent 7615162 Printed wiring board and method for manufacturing the same
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US Patent 7618515 Focus ring, plasma etching apparatus and plasma etching method
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US Patent 7622048 Sacrificial substrate for etching
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US Patent 7625824 Process change detection through the use of evolutionary algorithms
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US Patent 7625826 Method of manufacturing a semiconductor device and an apparatus for use in such a method
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US Patent 7632418 Method for forming note pads with shaped edges
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US Patent 7635650 Prevention of plasma induced damage arising from etching of crack stop trenches in multi-layered low-k semiconductor devices
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US Patent 7642194 Method for etching and apparatus for etching
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US Patent 7642195 Hydrogen treatment to improve photoresist adhesion and rework consistency
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US Patent 7642198 Method for evaluating crystal defects of silicon wafer
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US Patent 7645356 Method of processing wafers with resonant heating
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US Patent 7645704 Methods and apparatus of etch process control in fabrications of microstructures
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US Patent 7648641 Method and apparatus for creating a topographically patterned substrate
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US Patent 7651948 Pre-cleaning of substrates in epitaxy chambers
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US Patent 7651949 Method of manufacturing a semiconductor device
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US Patent 7655572 Semiconductor device manufacturing method, semiconductor device manufacturing apparatus, control program and computer storage medium
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US Patent 7658858 Band filter using film bulk acoustic resonator and method of fabricating the same
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US Patent 7659210 Nano-crystal etch process
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US Patent 7662723 Methods and apparatus for in-situ substrate processing
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US Patent 7670956 Beam-induced etching
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US Patent 7678706 Method of manufacturing a semiconductor device
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US Patent 7682982 Plasma processing apparatus and control method thereof
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US Patent 7682984 Interferometer endpoint monitoring device
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US Patent 7682986 Ultra-high aspect ratio dielectric etch
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US Patent 7687401 Substantially spherical composite ceria/titania particles
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US Patent 7687405 High resolution patterning of surface energy utilizing high resolution monomolecular resist for fabrication of patterned media masters
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US Patent 7691276 Method for manufacturing an electrical connecting element, and a connecting element
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US Patent 7691753 Deposition-selective etch-deposition process for dielectric film gapfill
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US Patent 7691754 Method for removing photoresist layer and method of forming opening
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US Patent 7696094 Method for improved planarization in semiconductor devices
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US Patent 7696095 Auto-stopping slurries for chemical-mechanical polishing of topographic dielectric silicon dioxide
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US Patent 7696103 Method for purifying silicon carbide coated structures
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US Patent 7696104 Mirror package and method of manufacturing the mirror package
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US Patent 7700489 Method of manufacturing a semiconductor device
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US Patent 7700494 Low-pressure removal of photoresist and etch residue
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US Patent 7704614 Process for fabricating patterned magnetic recording media
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US Patent 7704889 Method and system for advanced process control in an etch system by gas flow control on the basis of CD measurements
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US Patent 7704890 Method for fabricating thin film transistor and pixel structure
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US Patent 7713377 Apparatus and method for plasma treating a substrate
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US Patent 7713880 Recessing trench to target depth using feed forward data
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US Patent 7718032 Dry non-plasma treatment system and method of using
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US Patent 7718078 Manufacturing method of circuit board
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US Patent 7718537 Method for manufacturing a CBRAM semiconductor memory
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US Patent 7718538 Pulsed-plasma system with pulsed sample bias for etching semiconductor substrates
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US Patent 7718539 Method for photomask fabrication utilizing a carbon hard mask
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US Patent 7718542 Low-k damage avoidance during bevel etch processing
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US Patent 7718543 Two step etching of a bottom anti-reflective coating layer in dual damascene application
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US Patent 7723234 Method for selective CMP of polysilicon
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US Patent 7732340 Method for adjusting a critical dimension in a high aspect ratio feature
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US Patent 7732342 Method to increase the compressive stress of PECVD silicon nitride films
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US Patent 7732346 Wet cleaning process and method for fabricating semiconductor device using the same
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US Patent 7736530 CMP slurry and method for polishing semiconductor wafer using the same
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US Patent 7737042 Pulsed-plasma system for etching semiconductor structures
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US Patent 7741229 Method for manufacturing magnetic recording medium
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US Patent 7741230 Highly-selective metal etchants
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US Patent 7749914 Plasma etching method
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US Patent 7754098 Chemical-mechanical polishing composition and method for using the same
‌
US Patent 7754615 Method and apparatus for detecting endpoint in a dry etching system by monitoring a superimposed DC current
‌
US Patent 7754616 Semiconductor device and method of manufacturing the same
‌
US Patent 7759254 Method for forming impurity-introduced layer, method for cleaning object to be processed apparatus for introducing impurity and method for producing device
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US Patent 7759258 Method for making solar cell
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US Patent 7763546 Methods for reducing surface charges during the manufacture of microelectromechanical systems devices
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US Patent 7767054 Plasma processing apparatus
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US Patent 7776746 Method and apparatus for ultra thin wafer backside processing
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US Patent 7776748 Selective-redeposition structures for calibrating a plasma process
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US Patent 7776753 Method of fabricating semiconductor devices employing at least one modulation doped quantum well structure and one or more etch stop layers for accurate contact formation
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US Patent 7781343 Semiconductor substrate having a protection layer at the substrate back side
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US Patent 7781348 Method of forming an organic light-emitting display with black matrix
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US Patent 7785487 Polymeric barrier removal polishing slurry
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US Patent 7786019 Multi-step photomask etching with chlorine for uniformity control
‌
US Patent 7794613 Method of fabricating printhead having hydrophobic ink ejection face
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US Patent 7794617 Plasma etching method, plasma processing apparatus, control program and computer readable storage medium
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US Patent 7794798 Method for depositing films using gas cluster ion beam processing
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US Patent 7795152 Methods of making self-aligned nano-structures
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US Patent 7795153 Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of selected chamber parameters
‌
US Patent 7799688 Polishing fluid and method of polishing
‌
US Patent 7799689 Method and apparatus for chemical mechanical polishing including first and second polishing
‌
US Patent 7799694 Methods of forming semiconductor constructions
‌
US Patent 7799698 Deposition-selective etch-deposition process for dielectric film gapfill
‌
US Patent 7803281 Selective bonding for forming a microvalve
‌
US Patent 7803716 Fabrication method of semiconductor device
‌
US Patent 7807062 Electron induced chemical etching and deposition for local circuit repair
‌
US Patent 7807064 Halogen-free amorphous carbon mask etch having high selectivity to photoresist
‌
US Patent 7807579 Hydrogen ashing enhanced with water vapor and diluent gas
‌
US Patent 7807580 Triple poly-si replacement scheme for memory devices
‌
US Patent 7807581 Plasma processing apparatus and plasma processing method
‌
US Patent 7807583 High aspect ratio via etch
‌
US Patent 7811639 Apparatus and process for paint or lacquer coating of a metal sheet capable of coiling
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US Patent 7811640 Methods for fabricating polymer optical waveguides on large area panels
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US Patent 7815812 Method for controlling a process for fabricating integrated devices
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US Patent 7815814 Method and system for dry etching a metal nitride
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US Patent 7815815 Method and apparatus for processing the peripheral and edge portions of a wafer after performance of a surface treatment thereon
‌
US Patent 7815977 Process for depositing a thin layer and product obtained thereby
‌
US Patent 7820244 Method of forming a layer and method of removing reaction by-products
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US Patent 7824564 Method for flattening glass substrate
‌
US Patent 7824738 Coatings for turbine blades
‌
US Patent 7825034 Method of fabricating openings and contact holes
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US Patent 7828984 Imprint method, imprint apparatus, and process for producing chip
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US Patent 7828987 Organic BARC etch process capable of use in the formation of low K dual damascene integrated circuits
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US Patent 7829469 Method and system for uniformity control in ballistic electron beam enhanced plasma processing system
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US Patent 7829471 Cluster tool and method for process integration in manufacturing of a photomask
‌
US Patent 7833381 Optical emission interferometry for PECVD using a gas injection hole
‌
US Patent 7833430 Method for fabricating microstructure and microstructure
‌
US Patent 7833908 Slurry composition for chemical-mechanical polishing capable of compensating nanotopography effect and method for planarizing surface of semiconductor device using the same
‌
US Patent 7838430 Plasma control using dual cathode frequency mixing
‌
US Patent 7838432 Etch process with controlled critical dimension shrink
‌
US Patent 7838433 Cluster tool and method for process integration in manufacturing of a photomask
‌
US Patent 7838434 Method of plasma etching of high-K dielectric materials
‌
US Patent 7842191 CMP slurry for metallic film, polishing method and method of manufacturing semiconductor device
‌
US Patent 7842193 Polishing liquid
‌
US Patent 7846344 Method and device for modulating light
‌
US Patent 7846346 Processing apparatus and method
‌
US Patent 7846349 Solution for the selective removal of metal from aluminum substrates
‌
US Patent 7846848 Cluster tool with integrated metrology chamber for transparent substrates
‌
US Patent 7850862 Textured surface having undercut micro recesses in a surface
‌
US Patent 7850864 Plasma treating apparatus and plasma treating method
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US Patent 7850866 Etchant and array substrate having copper lines etched by the etchant
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US Patent 7851364 Method for forming pattern in semiconductor device
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US Patent 7851368 Methods and apparatus for igniting a low pressure plasma
‌
US Patent 7851375 Alkaline etchant for controlling surface roughness of semiconductor wafer
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US Patent 7854853 Nano fabrication method for glass
‌
US Patent 7855150 Plasma system and method for anisotropically etching structures into a substrate
‌
US Patent 7867405 Process for producing microfluidic arrangements from a plate-shaped composite structure
‌
US Patent 7871678 Method of increasing the reactivity of a precursor in a cyclic deposition process
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US Patent 7875195 Thick porous anodic alumina films and nanowire arrays grown on a solid substrate
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US Patent 7875555 Method for plasma processing over wide pressure range
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US Patent 7879255 Method and composition for electrochemically polishing a conductive material on a substrate
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US Patent 7879731 Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources
‌
US Patent 7883635 Substrate treating apparatus and method
‌
US Patent 7884024 Apparatus and method for optical interference fringe based integrated circuit processing
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US Patent 7884025 Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources
‌
US Patent 7884026 Method of fabricating dual damascene structure
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US Patent 7884028 Method of removing material layer and remnant metal
‌
US Patent 7887715 Chemical mechanical polishing slurry composition including non-ionized, heat activated nano-catalyst and polishing method using the same
‌
US Patent 7888685 High purity silicon carbide structures
‌
US Patent 7892443 Method of manufacturing member with concave portions, member with concave portions, lens substrate, transmission type screen and rear projection
‌
US Patent 7892980 Apparatus and a method for controlling the depth of etching during alternating plasma etching of semiconductor substrates
‌
US Patent 7892982 Method for forming fine patterns of a semiconductor device using a double patterning process
‌
US Patent 7897008 Apparatus and method for regional plasma control
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US Patent 7897059 High tin solder etching solution
‌
US Patent 7897061 Compositions and methods for CMP of phase change alloys
‌
US Patent 7902080 Deposition-plasma cure cycle process to enhance film quality of silicon dioxide
‌
US Patent 7906038 Aqueous polishing liquid and chemical mechanical polishing method
‌
US Patent 7910489 Infinitely selective photoresist mask etch
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US Patent 7914693 Stamp for micro/nano imprint lithography using diamond-like carbon and method of fabricating the same
‌
US Patent 7919414 Method for forming fine patterns in semiconductor device
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US Patent 7922865 Magnetic field generator for magnetron plasma, and plasma etching apparatus and method comprising the magnetic field generator
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US Patent 7922920 Systems, methods, and apparatus of a low conductance silicon micro-leak for mass spectrometer inlet
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US Patent 7922927 Method of forming one or more nanopores for aligning molecules for molecular electronics
‌
US Patent 7923373 Pitch multiplication using self-assembling materials
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US Patent 7923374 Method and apparatus for production of metal film or the like
‌
US Patent 7923375 Method for manufacturing semiconductor device
‌
US Patent 7927498 Solar cell and method of texturing solar cell
‌
US Patent 7931818 Process of embedded circuit structure
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US Patent 7932183 Method of manufacturing multilayer thin film pattern and display device
‌
US Patent 7935218 Optical apparatus, lithographic apparatus and device manufacturing method
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US Patent 7935642 Replenishment method for an advanced coating removal stripping solution
‌
US Patent 7938974 Method of fabricating printhead using metal film for protecting hydrophobic ink ejection face
‌
US Patent 7943005 Method and apparatus for photomask plasma etching
‌
US Patent 7951718 Edge removal of silicon-on-insulator transfer wafer
‌
US Patent 7955513 Apparatus and method for reactive atom plasma processing for material deposition
‌
US Patent 7959820 Substrate processing method and substrate processing apparatus
‌
US Patent 7964508 Dielectric trenches, nickel/tantalum oxide structures, and chemical mechanical polishing techniques
‌
US Patent 7968469 Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity
‌
US Patent 7972970 Fabrication of semiconductor interconnect structure
‌
US Patent 7976715 Method using block copolymers for making a master mold with high bit-aspect-ratio for nanoimprinting patterned magnetic recording disks
‌
US Patent 7976718 System and method for selective etching of silicon nitride during substrate processing
‌
US Patent 7977251 High selectivity BPSG to TEOS etchant
‌
US Patent 7985692 Method to reduce charge buildup during high aspect ratio contact etch
‌
US Patent 7988875 Differential etch rate control of layers deposited by chemical vapor deposition
‌
US Patent 7988878 Selective barrier slurry for chemical mechanical polishing
‌
US Patent 7989353 Method for in-situ refurbishing a ceramic substrate holder
‌
US Patent 7993536 Method of manufacturing magnetic recording medium
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US Patent 7998359 Methods of etching silicon-containing films on silicon substrates
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US Patent 7998872 Method for etching a silicon-containing ARC layer to reduce roughness and CD
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US Patent 8007673 Method of manufacturing circuit board
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US Patent 8007676 Slurry compositions, methods of preparing slurry compositions, and methods of polishing an object using slurry compositions
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US Patent 8008210 Exposure mask with double patterning technology and method for fabricating semiconductor device using the same
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US Patent 8008212 Fabrication methods for integration CMOS and BJT devices
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US Patent 8012361 Method of manufacturing magnetic recording medium
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US Patent 8012363 Metal film protection during printhead fabrication with minimum number of MEMS processing steps
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US Patent 8012879 Etching method using an at least semi-solid media
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US Patent 8012882 Method of manufacturing nitride substrate for semiconductors
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US Patent 8012883 Stripping method
Edits on 13 Dec, 2021
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edited on 13 Dec, 2021
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US Patent 8012883 Stripping method
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edited on 13 Dec, 2021
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US Patent 8012882 Method of manufacturing nitride substrate for semiconductors
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edited on 13 Dec, 2021
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US Patent 8012879 Etching method using an at least semi-solid media
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edited on 13 Dec, 2021
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US Patent 8012361 Method of manufacturing magnetic recording medium
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edited on 8 Dec, 2021
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US Patent 8008212 Fabrication methods for integration CMOS and BJT devices
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edited on 8 Dec, 2021
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US Patent 8007673 Method of manufacturing circuit board
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edited on 8 Dec, 2021
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edited on 8 Dec, 2021
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US Patent 7998872 Method for etching a silicon-containing ARC layer to reduce roughness and CD
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edited on 8 Dec, 2021
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US Patent 7998359 Methods of etching silicon-containing films on silicon substrates
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edited on 8 Dec, 2021
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US Patent 7993536 Method of manufacturing magnetic recording medium
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edited on 8 Dec, 2021
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US Patent 7989353 Method for in-situ refurbishing a ceramic substrate holder
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edited on 8 Dec, 2021
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US Patent 7988875 Differential etch rate control of layers deposited by chemical vapor deposition
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edited on 8 Dec, 2021
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US Patent 7988878 Selective barrier slurry for chemical mechanical polishing
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US Patent 7985692 Method to reduce charge buildup during high aspect ratio contact etch

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