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Jiong-Ping Lu

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Edits on 14 Dec, 2021
"Remove inverse infobox"
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Golden AI
edited on 14 Dec, 2021
Edits made to:
Infobox (-6 properties)
Infobox
Patent primary examiner of
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US Patent 11171013 Leveraging precursor molecular composition and structure for atomic layer etching
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US Patent 11177135 Mask member and method for producing semiconductor device
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US Patent 11183397 Selective etch process using hydrofluoric acid and ozone gases
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US Patent 11186748 Aqueous anionic functional silica slurry and amine carboxylic acid compositions for selective nitride removal in polishing and methods of using them
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US Patent 11186749 Slurry composition and method of manufacturing integrated circuit device by using the same
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US Patent 11186772 Etching composition, method for etching insulating film of semiconductor devices using the same and method for preparing semiconductor devices
Edits on 2 Dec, 2021
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Golden AI
edited on 2 Dec, 2021
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Golden AI
edited on 2 Dec, 2021
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edited on 2 Dec, 2021
Edits on 25 Nov, 2021
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Golden AI
edited on 25 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 11183397 Selective etch process using hydrofluoric acid and ozone gases
Edits on 19 Nov, 2021
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Golden AI
edited on 19 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 11177135 Mask member and method for producing semiconductor device
Edits on 11 Nov, 2021
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Golden AI
edited on 11 Nov, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 11171013 Leveraging precursor molecular composition and structure for atomic layer etching
"Created via: Entity Importer"
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Golden AI
created this topic on 11 Nov, 2021
Edits made to:
Infobox (+2 properties)
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 Jiong-Ping Lu

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Person
Person
Current Employer
United States Patent and Trademark Office
United States Patent and Trademark Office

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