List of OC Oerlikon patents

Patents where

Current Assignee

Name

OC Oerlikon

Name	Description	Current Assignee	Patent Jurisdiction	Patent Number	Date of Patent
‌ US Patent 7227633 Optical substrate for enhanced detectability of fluorescence	Patent 7227633 was granted and assigned to OC Oerlikon on June, 2007 by the United States Patent and Trademark Office.	OC Oerlikon	United States Patent and Trademark Office	7227633	June 5, 2007
‌ US Patent 7105080 Vacuum treatment system and method of manufacturing same	Patent 7105080 was granted and assigned to OC Oerlikon on September, 2006 by the United States Patent and Trademark Office.	OC Oerlikon	United States Patent and Trademark Office	7105080	September 12, 2006
‌ US Patent RE40191 Vacuum process apparatus	Patent RE40191 was granted and assigned to OC Oerlikon on April, 2008 by the United States Patent and Trademark Office.	OC Oerlikon	United States Patent and Trademark Office	RE40191	April 1, 2008
‌ US Patent RE40192 Vacuum process apparatus	Patent RE40192 was granted and assigned to OC Oerlikon on April, 2008 by the United States Patent and Trademark Office.	OC Oerlikon	United States Patent and Trademark Office	RE40192	April 1, 2008
‌ US Patent 7420449 Mirror actuating device for projection systems	Patent 7420449 was granted and assigned to OC Oerlikon on September, 2008 by the United States Patent and Trademark Office.	OC Oerlikon	United States Patent and Trademark Office	7420449	September 2, 2008
‌ US Patent 7153363 Atomic layer deposition	Patent 7153363 was granted and assigned to OC Oerlikon on December, 2006 by the United States Patent and Trademark Office.	OC Oerlikon	United States Patent and Trademark Office	7153363	December 26, 2006
‌ US Patent 7368041 Method for controlling plasma density or the distribution thereof	Patent 7368041 was granted and assigned to OC Oerlikon on May, 2008 by the United States Patent and Trademark Office.	OC Oerlikon	United States Patent and Trademark Office	7368041	May 6, 2008
‌ US Patent 7429543 Method for the production of a substrate	Patent 7429543 was granted and assigned to OC Oerlikon on September, 2008 by the United States Patent and Trademark Office.	OC Oerlikon	United States Patent and Trademark Office	7429543	September 30, 2008
‌ US Patent 7169252 Method for the assembly of light integrators	Patent 7169252 was granted and assigned to OC Oerlikon on January, 2007 by the United States Patent and Trademark Office.	OC Oerlikon	United States Patent and Trademark Office	7169252	January 30, 2007
‌ US Patent 7492091 Diffusion barrier layer and method for manufacturing a diffusion barrier layer	Patent 7492091 was granted and assigned to OC Oerlikon on February, 2009 by the United States Patent and Trademark Office.	OC Oerlikon	United States Patent and Trademark Office	7492091	February 17, 2009
‌ US Patent 7595096 Method of manufacturing vacuum plasma treated workpieces	Patent 7595096 was granted and assigned to OC Oerlikon on September, 2009 by the United States Patent and Trademark Office.	OC Oerlikon	United States Patent and Trademark Office	7595096	September 29, 2009
‌ US Patent 7295392 Color wheel with aligned segments	Patent 7295392 was granted and assigned to OC Oerlikon on November, 2007 by the United States Patent and Trademark Office.	OC Oerlikon	United States Patent and Trademark Office	7295392	November 13, 2007
‌ US Patent 7348074 Multilayer hard coating for tools	Patent 7348074 was granted and assigned to OC Oerlikon on March, 2008 by the United States Patent and Trademark Office.	OC Oerlikon	United States Patent and Trademark Office	7348074	March 25, 2008
‌ US Patent 7244086 Apparatus for vacuum treating two dimensionally extended substrates and method for manufacturing such substrates	Patent 7244086 was granted and assigned to OC Oerlikon on July, 2007 by the United States Patent and Trademark Office.	OC Oerlikon	United States Patent and Trademark Office	7244086	July 17, 2007
‌ US Patent 7381661 Method for the production of a substrate with a magnetron sputter coating and unit for the same	Patent 7381661 was granted and assigned to OC Oerlikon on June, 2008 by the United States Patent and Trademark Office.	OC Oerlikon	United States Patent and Trademark Office	7381661	June 3, 2008
‌ US Patent 7179352 Vacuum treatment system and process for manufacturing workpieces	Patent 7179352 was granted and assigned to OC Oerlikon on February, 2007 by the United States Patent and Trademark Office.	OC Oerlikon	United States Patent and Trademark Office	7179352	February 20, 2007
‌ US Patent 7226670 Work piece with a hard film of AlCr-containing material, and process for its production	Patent 7226670 was granted and assigned to OC Oerlikon on June, 2007 by the United States Patent and Trademark Office.	OC Oerlikon	United States Patent and Trademark Office	7226670	June 5, 2007
‌ US Patent 7718042 Method for manufacturing sputter-coated substrates, magnetron source and sputtering chamber with such source	Patent 7718042 was granted and assigned to OC Oerlikon on May, 2010 by the United States Patent and Trademark Office.	OC Oerlikon	United States Patent and Trademark Office	7718042	May 18, 2010
‌ US Patent 8246794 Method of magnetron sputtering and a method for determining a power modulation compensation function for a power supply applied to a magnetron sputtering source	Patent 8246794 was granted and assigned to OC Oerlikon on August, 2012 by the United States Patent and Trademark Office.	OC Oerlikon	United States Patent and Trademark Office	8246794	August 21, 2012
‌ US Patent 7706908 Method for positioning a wafer	Patent 7706908 was granted and assigned to OC Oerlikon on April, 2010 by the United States Patent and Trademark Office.	OC Oerlikon	United States Patent and Trademark Office	7706908	April 27, 2010
‌ US Patent 8574409 Method of magnetron sputtering and a method for determining a power modulation compensation function for a power supply applied to a magnetron sputtering source	Patent 8574409 was granted and assigned to OC Oerlikon on November, 2013 by the United States Patent and Trademark Office.	OC Oerlikon	United States Patent and Trademark Office	8574409	November 5, 2013
‌ US Patent 7784426 Plasma reactor for the treatment of large size substrates	Patent 7784426 was granted and assigned to OC Oerlikon on August, 2010 by the United States Patent and Trademark Office.	OC Oerlikon	United States Patent and Trademark Office	7784426	August 31, 2010
‌ US Patent 7736462 Installation for processing a substrate	Patent 7736462 was granted and assigned to OC Oerlikon on June, 2010 by the United States Patent and Trademark Office.	OC Oerlikon	United States Patent and Trademark Office	7736462	June 15, 2010
‌ US Patent 8435389 RF substrate bias with high power impulse magnetron sputtering (HIPIMS)	Patent 8435389 was granted and assigned to OC Oerlikon on May, 2013 by the United States Patent and Trademark Office.	OC Oerlikon	United States Patent and Trademark Office	8435389	May 7, 2013
‌ US Patent 8475634 Application of HIPIMS to through silicon via metallization in three-dimensional wafer packaging	Patent 8475634 was granted and assigned to OC Oerlikon on July, 2013 by the United States Patent and Trademark Office.	OC Oerlikon	United States Patent and Trademark Office	8475634	July 2, 2013

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