List of Aixtron patents

Patents where

Current Assignee

Name

Aixtron

Name	Description	Patent Applicant	Current Assignee	Patent Jurisdiction	Patent Number	Date of Patent
‌ US Patent 9159608 Method for forming TiSiN thin film layer by using atomic layer deposition	Patent 9159608 was granted and assigned to Aixtron on October, 2015 by the United States Patent and Trademark Office.	Aixtron	Aixtron	United States Patent and Trademark Office	9159608	October 13, 2015
‌ US Patent 11479851 Substrate holder arrangement with mask support		Aixtron	Aixtron	United States Patent and Trademark Office	11479851	October 25, 2022
‌ US Patent 11746419 Shield plate for a CVD reactor	Patent 11746419 was granted and assigned to Aixtron on September, 2023 by the United States Patent and Trademark Office.	Aixtron	Aixtron	United States Patent and Trademark Office	11746419	September 5, 2023
‌ US Patent 9587312 Gas inlet member of a CVD reactor	Patent 9587312 was granted and assigned to Aixtron on March, 2017 by the United States Patent and Trademark Office.		Aixtron	United States Patent and Trademark Office	9587312	March 7, 2017
‌ US Patent 10329668 Device and method for exhaust gas treatment on CVD reactor	Patent 10329668 was granted and assigned to Aixtron on June, 2019 by the United States Patent and Trademark Office.	Aixtron	Aixtron	United States Patent and Trademark Office	10329668	June 25, 2019
‌ US Patent 9988712 Substrate holding device	Patent 9988712 was granted and assigned to Aixtron on June, 2018 by the United States Patent and Trademark Office.	Aixtron	Aixtron	United States Patent and Trademark Office	9988712	June 5, 2018
‌ US Patent 11396697 Device for separating a structured layer on a substrate, and method for setting up the device	Patent 11396697 was granted and assigned to Aixtron on July, 2022 by the United States Patent and Trademark Office.	Aixtron	Aixtron	United States Patent and Trademark Office	11396697	July 26, 2022
‌ US Patent 11168410 Susceptor for a chemical vapour deposition reactor	Patent 11168410 was granted and assigned to Aixtron on November, 2021 by the United States Patent and Trademark Office.	Aixtron	Aixtron	United States Patent and Trademark Office	11168410	November 9, 2021
‌ US Patent 9721759 System and method for distributing RF power to a plasma source	Patent 9721759 was granted and assigned to Aixtron on August, 2017 by the United States Patent and Trademark Office.	Aixtron	Aixtron	United States Patent and Trademark Office	9721759	August 1, 2017
‌ US Patent 11441223 Susceptor for a CVD reactor		Aixtron	Aixtron	United States Patent and Trademark Office	11441223	September 13, 2022
‌ US Patent 11286566 Apparatus for deposition of a III-V semiconductor layer	Patent 11286566 was granted and assigned to Aixtron on March, 2022 by the United States Patent and Trademark Office.	Aixtron	Aixtron	United States Patent and Trademark Office	11286566	March 29, 2022
‌ US Patent 10501847 Apparatus and method for generating a vapor for a CVD or PVD device	Patent 10501847 was granted and assigned to Aixtron on December, 2019 by the United States Patent and Trademark Office.	Aixtron	Aixtron	United States Patent and Trademark Office	10501847	December 10, 2019
‌ US Patent 9443702 Methods for plasma processing	Patent 9443702 was granted and assigned to Aixtron on September, 2016 by the United States Patent and Trademark Office.	Aixtron	Aixtron	United States Patent and Trademark Office	9443702	September 13, 2016
‌ US Patent 9942946 Device for generating vapor from solid or liquid starting material for CVD or PVD apparatus	Patent 9942946 was granted and assigned to Aixtron on April, 2018 by the United States Patent and Trademark Office.	Aixtron	Aixtron	United States Patent and Trademark Office	9942946	April 10, 2018
‌ US Patent 9045818 Shadow mask held magnetically on a substrate support	Patent 9045818 was granted and assigned to Aixtron on June, 2015 by the United States Patent and Trademark Office.		Aixtron	United States Patent and Trademark Office	9045818	June 2, 2015
‌ US Patent 10883171 CVD reactor and method for cleaning a CVD reactor	Patent 10883171 was granted and assigned to Aixtron on January, 2021 by the United States Patent and Trademark Office.	Aixtron	Aixtron	United States Patent and Trademark Office	10883171	January 5, 2021
‌ US Patent 10260147 Device for depositing nanotubes	Patent 10260147 was granted and assigned to Aixtron on April, 2019 by the United States Patent and Trademark Office.	Aixtron	Aixtron	United States Patent and Trademark Office	10260147	April 16, 2019
‌ US Patent 9822451 Device and method for manufacturing nanostructures consisting of carbon	Patent 9822451 was granted and assigned to Aixtron on November, 2017 by the United States Patent and Trademark Office.	Aixtron	Aixtron	United States Patent and Trademark Office	9822451	November 21, 2017
‌ US Patent 10273580 Heating device	Patent 10273580 was granted and assigned to Aixtron on April, 2019 by the United States Patent and Trademark Office.	Aixtron	Aixtron	United States Patent and Trademark Office	10273580	April 30, 2019
‌ US Patent 10049859 Plasma generating units for processing a substrate	Patent 10049859 was granted and assigned to Aixtron on August, 2018 by the United States Patent and Trademark Office.		Aixtron	United States Patent and Trademark Office	10049859	August 14, 2018
‌ US Patent 9970106 CVD system having particle separator	Patent 9970106 was granted and assigned to Aixtron on May, 2018 by the United States Patent and Trademark Office.	Aixtron	Aixtron	United States Patent and Trademark Office	9970106	May 15, 2018
‌ US Patent 9831466 Method for depositing a multi-layer moisture barrier on electronic devices and electronic devices protected by a multi-layer moisture barrier	Patent 9831466 was granted and assigned to Aixtron on November, 2017 by the United States Patent and Trademark Office.	Aixtron	Aixtron	United States Patent and Trademark Office	9831466	November 28, 2017
‌ US Patent 10563300 Method for separating a carbon structure from a seed structure	Patent 10563300 was granted and assigned to Aixtron on February, 2020 by the United States Patent and Trademark Office.	Aixtron	Aixtron	United States Patent and Trademark Office	10563300	February 18, 2020
‌ US Patent 10221482 Gas distributor for a CVD reactor	Patent 10221482 was granted and assigned to Aixtron on March, 2019 by the United States Patent and Trademark Office.	Aixtron	Aixtron	United States Patent and Trademark Office	10221482	March 5, 2019
‌ US Patent 9564329 Method and apparatus for fabricating dielectric structures	Patent 9564329 was granted and assigned to Aixtron on February, 2017 by the United States Patent and Trademark Office.		Aixtron	United States Patent and Trademark Office	9564329	February 7, 2017

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