US Patent D974669 Oblique-impact protection layer with pattern
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Patent Inventor Names
Tien Hou Cheng0
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US Patent D0974669 Oblique-impact protection layer with pattern US Patent D974669 Oblique-impact protection layer with pattern
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Patent Number
D09746690
Patent Number
D9746690
Edits on 28 Apr, 2023
Golden AI
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Patent Citations
Edits on 22 Mar, 2023
Golden AI
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Patent Citations
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US Patent D0974669 Oblique-impact protection layer with pattern
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Is a
Patent Jurisdiction
Patent Number
D09746690
Date of Patent
January 3, 2023
0Patent Application Number
297262220
Date Filed
March 2, 2020
0Patent Citations
Patent Primary Examiner
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