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US Patent D619630 Process tube for manufacturing semiconductor wafers

Patent D619630 was granted and assigned to Tokyo Electron on July, 2010 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Current Assignee

Tokyo Electron

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

D6196300

Patent Inventor Names

Hirofumi Kaneko0

Date of Patent

July 13, 2010

Patent Application Number

292902470

Date Filed

November 8, 2007

Patent Citations Received

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US Patent D1022907 Tubular reactor

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US Patent D1019582 Inner tube of reaction tube for semiconductor manufacturing equipment

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US Patent D1022905 Tubular reactor

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US Patent D1022906 Tubular reactor

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US Patent D1022904 Tubular reactor

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US Patent D1019583 Inner tube of reaction tube for semiconductor manufacturing equipment

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US Patent D1019581 Inner tube of reaction tube for semiconductor manufacturing equipment

Patent Primary Examiner

Sandra Snapp

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